Abstract: Semiconductor devices and methods of forming the same are provided. In some embodiments, a method includes receiving a workpiece having a redistribution layer disposed over and electrically coupled to an interconnect structure. In some embodiments, the method further includes patterning the redistribution layer to form a recess between and separating a first conductive feature and a second conductive feature of the redistribution layer, where corners of the first conductive feature and the second conductive feature are defined adjacent to and on either side of the recess. The method further includes depositing a first dielectric layer over the first conductive feature, the second conductive feature, and within the recess. The method further includes depositing a nitride layer over the first dielectric layer. In some examples, the method further includes removing portions of the nitride layer disposed over the corners of the first conductive feature and the second conductive feature.

Abstract: A device includes: a complementary transistor including: a first transistor having a first source/drain region and a second source/drain region; and a second transistor stacked on the first transistor, and having a third source/drain region and a fourth source/drain region, the third source/drain region overlapping the first source/drain region, the fourth source/drain region overlapping the second source/drain region. The device further includes: a first source/drain contact electrically coupled to the third source/drain region; a second source/drain contact electrically coupled to the second source/drain region; a gate isolation structure adjacent the first and second transistors; and an interconnect structure electrically coupled to the first source/drain contact and the second source/drain contact.

Abstract: A 2D video to 3D video conversion system includes a video content analysis unit, a depth estimation unit, a post-processing unit, and a stereoscopic video generation unit. The video content analysis unit can analyze a 2D video datum and extract useful information including motion and color from the 2D video datum for depth estimation. The depth estimation unit is adapted for receiving the useful information, calculating motion cue and contrast cue for initial depth estimation, and generating an initial depth map. The post-processing unit is adapted for correcting the initial depth map in spatial domain and temporal domain to increase accuracy in spatial domain and depth continuity between adjacent time instances and for processing the caption in the video to generate a final depth map. The stereoscopic video generation unit is adapted for synthesizing 3D video datum from the final depth map and 2D video datum.

Abstract: A 2D video to 3D video conversion system includes a video content analysis unit, a depth estimation unit, a post-processing unit, and a stereoscopic video generation unit. The video content analysis unit can analyze a 2D video datum and extract useful information including motion and color from the 2D video datum for depth estimation. The depth estimation unit is adapted for receiving the useful information, calculating motion cue and contrast cue for initial depth estimation, and generating an initial depth map. The post-processing unit is adapted for correcting the initial depth map in spatial domain and temporal domain to increase accuracy in spatial domain and depth continuity between adjacent time instances and for processing the caption in the video to generate a final depth map. The stereoscopic video generation unit is adapted for synthesizing 3D video datum from the final depth map and 2D video datum.

Abstract: A method to selectively amend a layout pattern is disclosed. First, a layout pattern including at least a first group and a second group is provided, wherein each one of the first group and the second group respectively includes multiple members. Second, a simulation procedure and an amendment procedure are respectively performed on all the members of the first group and the second group to obtain an amended first group and an amended second group. Then, the amended first group and the amended second group are verified as being on target or not. Afterwards, the layout pattern including the on target amended first group and the on target amended second group is output.

Abstract: A method to selectively amend a layout pattern is disclosed. First, a layout pattern including at least a first group and a second group is provided, wherein each one of the first group and the second group respectively includes multiple members. Second, a simulation procedure and an amendment procedure are respectively performed on all the members of the first group and the second group to obtain an amended first group and an amended second group. Then, the amended first group and the amended second group are verified as being on target or not. Afterwards, the layout pattern including the on target amended first group and the on target amended second group is output.