Patents by Inventor Hsiao-Fen Cheng

Hsiao-Fen Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for removing impurities from porous materials
    Patent number: 7124764
    Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: October 24, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Kon-Tsu Kin, Chiou-Mei Chen, Pei-Lin Chang, Hsiao-Fen Cheng
  • Method for removing impurities from porous materials
    Publication number: 20060137718
    Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.
    Type: Application
    Filed: December 29, 2004
    Publication date: June 29, 2006
    Applicant: Industrial Technology Research Institute
    Inventors: Kon-Tsu Kin, Chiou-Mei Chen, Pei-Lin Chang, Hsiao-Fen Cheng
  • Process for removing organics from ultrapure water
    Patent number: 6991733
    Abstract: In order to reduce a total organic carbon (TOC) in ultrapure water to a level less than 1 ppb, several cycles of ozone contact/UV irradiation treatments are carried out in sequence. Preferably, the first cycle further includes an ion exchange treatment which is applied to the resulting UV irradiation water.
    Type: Grant
    Filed: May 25, 2004
    Date of Patent: January 31, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Kon-Tsu Kin, Pei-Lin Chang, Farhang Shadman, Hsiao-Fen Cheng
  • PROCESS FOR REMOVING ORGANICS FROM ULTRAPURE WATER
    Publication number: 20050263458
    Abstract: In order to reduce a total organic carbon (TOC) in ultrapure water to a level less than 1 ppb, several cycles of ozone contact/UV irradiation treatments are carried out in sequence. Preferably, the first cycle further includes an ion exchange treatment which is applied to the resulting UV irradiation water.
    Type: Application
    Filed: May 25, 2004
    Publication date: December 1, 2005
    Applicant: Industrial Technology Research Institute
    Inventors: Kon-Tsu Kin, Pei-Lin Chang, Farhang Shadman, Hsiao-Fen Cheng