Patents by Inventor Hsieh-Mei Liu

Hsieh-Mei Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask pellicle remove tool
    Patent number: 5953107
    Abstract: A mask pellicle removal methods for separating a mask pellicle from a glass reticle to which it is bonded by prying against its releasable bond. The methods includes a table support for nesting the glass reticle and for supporting a manually operated prying mechanism having only the necessary degrees of freedom for prying free the mask pellicle without damaging the glass reticle.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: September 14, 1999
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Meng-Chun Li, Hsieh-Mei Liu