Patents by Inventor Hsien-Chung Huang

Hsien-Chung Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240096705
    Abstract: A semiconductor device includes a plurality of channel layers vertically separated from one another. The semiconductor device also includes an active gate structure comprising a lower portion and an upper portion. The lower portion wraps around each of the plurality of channel layers. The semiconductor device further includes a gate spacer extending along a sidewall of the upper portion of the active gate structure. The gate spacer has a bottom surface. Moreover, a dummy gate dielectric layer is disposed between the gate spacer and a topmost channel layer of plurality of channel layers. The dummy gate dielectric layer is in contact with a top surface of the topmost channel layer, the bottom surface of the gate spacer, and the sidewall of the gate structure.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuei-Yu Kao, Chen-Yui Yang, Hsien-Chung Huang, Chao-Cheng Chen, Shih-Yao Lin, Chih-Chung Chiu, Chih-Han Lin, Chen-Ping Chen, Ke-Chia Tseng, Ming-Ching Chang
  • Publication number: 20240071849
    Abstract: A semiconductor package including one or more dam structures and the method of forming are provided. A semiconductor package may include an interposer, a semiconductor die bonded to a first side of the interposer, an encapsulant on the first side of the interposer encircling the semiconductor die, a substrate bonded to the a second side of the interposer, an underfill between the interposer and the substrate, and one or more of dam structures on the substrate. The one or more dam structures may be disposed adjacent respective corners of the interposer and may be in direct contact with the underfill. The coefficient of thermal expansion of the one or more of dam structures may be smaller than the coefficient of thermal expansion of the underfill.
    Type: Application
    Filed: August 26, 2022
    Publication date: February 29, 2024
    Inventors: Jian-You Chen, Kuan-Yu Huang, Li-Chung Kuo, Chen-Hsuan Tsai, Kung-Chen Yeh, Hsien-Ju Tsou, Ying-Ching Shih, Szu-Wei Lu
  • Patent number: 11842929
    Abstract: A semiconductor device includes a plurality of channel layers vertically separated from one another. The semiconductor device also includes an active gate structure comprising a lower portion and an upper portion. The lower portion wraps around each of the plurality of channel layers. The semiconductor device further includes a gate spacer extending along a sidewall of the upper portion of the active gate structure. The gate spacer has a bottom surface. Moreover, a dummy gate dielectric layer is disposed between the gate spacer and a topmost channel layer of plurality of channel layers. The dummy gate dielectric layer is in contact with a top surface of the topmost channel layer, the bottom surface of the gate spacer, and the sidewall of the gate structure.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: December 12, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuei-Yu Kao, Shih-Yao Lin, Chen-Ping Chen, Chih-Chung Chiu, Chen-Yui Yang, Ke-Chia Tseng, Hsien-Chung Huang, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen
  • Publication number: 20230060825
    Abstract: A semiconductor device includes a plurality of channel layers vertically separated from one another. The semiconductor device also includes an active gate structure comprising a lower portion and an upper portion. The lower portion wraps around each of the plurality of channel layers. The semiconductor device further includes a gate spacer extending along a sidewall of the upper portion of the active gate structure. The gate spacer has a bottom surface. Moreover, a dummy gate dielectric layer is disposed between the gate spacer and a topmost channel layer of plurality of channel layers. The dummy gate dielectric layer is in contact with a top surface of the topmost channel layer, the bottom surface of the gate spacer, and the sidewall of the gate structure.
    Type: Application
    Filed: August 30, 2021
    Publication date: March 2, 2023
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuei-Yu Kao, Shih-Yao Lin, Chen-Ping Chen, Chih-Chung Chiu, Chen-Yui Yang, Ke-Chia Tseng, Hsien-Chung Huang, Chih-Han Lin, Ming-Ching Chang, Chao-Cheng Chen
  • Publication number: 20220301922
    Abstract: A device includes a substrate, a first fin, a second fin, a first isolation structure, a second isolation structure, and a gate structure. The first fin extends from a p-type region of the substrate. The second fin extends from an n-type region of the substrate. The first isolation structure is over the p-type region and adjacent to the first fin. The first isolation structure has a bottom surface and opposite first and second sidewalls connected to the bottom surface, a first round corner is between the bottom surface and the first sidewall of the first isolation structure, and the first sidewall is substantially parallel to the second sidewall. The second isolation structure is over the n-type region and adjacent to the first fin. The first isolation structure is deeper than the second isolation structure. The gate structure is over the first isolation structure and covering the first fin.
    Type: Application
    Filed: July 9, 2021
    Publication date: September 22, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsien-Chung HUANG, Chiung-Wen HSU, Mei-Ju KUO, Yu-Ting WENG, Yu-Chi LIN, Ting-Chung WANG, Chao-Cheng CHEN
  • Patent number: 6648432
    Abstract: A foldable structure for a main unit and screen for a game machine whose rotation pivot seat contains a base, top cover and axle joint in-between. A short axle is placed in a transverse through-hole and an axle hole is placed in a cylindrical axle of a pivot joint to allow rotation of the screen around the rotational pivot seat. The movable retainers of the positioning fastener are installed outside two ends of an arch plate. A pressure-sustaining device is installed on the pillar to provide elastic recovery for the arch plate. The contact area between the press button and arch plate forms an inclined push edge to enable a stepwise push on the arch plate and further allow the movable retainer to contract inward to facilitate disassembly and assembly of the main unit of the game machine.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: November 18, 2003
    Inventor: Hsien-Chung Huang
  • Publication number: 20030122973
    Abstract: The present invention relates to a foldable structure for a main unit and screen for a game machine whose rotation pivot seat contains a base, top cover and axle joint in-between. A short axle is placed in a transverse through-hole and an axle hole is placed in a cylindrical axle of a pivot joint to allow rotation of the screen around the rotational pivot seat. The moveable retainers of the positioning fasteners are installed outside two ends of an arch plate. A pressure-sustaining device is installed on the pillar to provide elastic recovery for the arch plate. The contact area between the press button and arch plate forms a inclined push edge to enable a stepwise push on the arch plate and further allow the movable retainer to contract inward to facilitate disassembly and assembly of the main unit of the game machine.
    Type: Application
    Filed: December 28, 2001
    Publication date: July 3, 2003
    Inventor: Hsien-Chung Huang