Patents by Inventor Hsien-Po Wang

Hsien-Po Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gradient material layer and method for manufacturing the same
    Patent number: 11124867
    Abstract: The present invention provides a gradient material layer and a method for manufacturing the same. The gradient material layer has a base-material region, a diffusion region, and a compound region, wherein the diffusion region is located between the base-material region and the compound region. The base-material region includes a metal material. The diffusion region doped with nitrogen includes the metal material. The compound region includes metal nitride. The nitrogen content of the compound region is greater than that of the diffusion region.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: September 21, 2021
    Assignee: National Taiwan University of Science and Technology
    Inventors: Yu-Lin Kuo, Hsien-Po Wang, Jhao-Yu Guo
  • GRADIENT MATERIAL LAYER AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20210285083
    Abstract: The present invention provides a gradient material layer and a method for manufacturing the same. The gradient material layer has a base-material region, a diffusion region, and a compound region, wherein the diffusion region is located between the base-material region and the compound region. The base-material region includes a metal material. The diffusion region doped with nitrogen includes the metal material. The compound region includes metal nitride. The nitrogen content of the compound region is greater than that of the diffusion region.
    Type: Application
    Filed: March 13, 2020
    Publication date: September 16, 2021
    Applicant: National Taiwan University of Science and Technology
    Inventors: Yu-Lin Kuo, Hsien-Po Wang, Jhao-Yu Guo