Patents by Inventor Hsien-shu Tsai

Hsien-shu Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6500059
    Abstract: A wafer mounting plate for use in a polishing apparatus is disclosed. The wafer mounting plate includes a metal plate and a screen mounted to a top surface of the metal plate. The metal plate is normally formed of circular shape and provided with a plurality of vacuum passageways therethrough. The metal plate has a bottom surface for engaging a membrane member and a wafer by vacuum through the plurality of vacuum passageways, and a top surface for engaging a pressurizing means, such as a pneumatic gasket. The screen mounted to the top surface of the metal plate has a multiplicity of apertures each of a size not larger than 0.5 mm in diameter. The screen is mounted sandwiched between the top surface of the metal plate and the pressurizing means. The screen effectively prevents debris of a wafer breakage from entering a vacuum system that is used for holding the wafer on the wafer mounting plate.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: December 31, 2002
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd
    Inventors: Yi-Sen Chang, Hsien-Shu Tsai
  • Patent number: 6482074
    Abstract: An apparatus and a method for transferring a rotational torque from a hub frame to a hub shaft onto which a pad conditioning disc is attached are disclosed. The apparatus is constructed by a hub frame, a hub shaft and a hub spacer that is assembled to the hub shaft. Providing a great improvement over the conventional design wherein a hub spacer is mounted to a hub shaft by screw means, the present invention conditioning head is assembled together by frictionally engaging a key on the hub spacer to a slot opening on the hub shaft such that any catastrophic failure due to screw breakage can be avoided. The present invention novel frictional engagement further provides a more uniform torque transfer between the two components.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: November 19, 2002
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Yi-Sen Chang, Hsien-Shu Tsai
  • Publication number: 20020068512
    Abstract: A wafer mounting plate for use in a polishing apparatus is disclosed. The wafer mounting plate includes a metal plate and a screen mounted to a top surface of the metal plate. The metal plate is normally formed of circular shape and provided with a plurality of vacuum passageways therethrough. The metal plate has a bottom surface for engaging a membrane member and a wafer by vacuum through the plurality of vacuum passageways, and a top surface for engaging a pressurizing means, such as a pneumatic gasket. The screen mounted to the top surface of the metal plate has a multiplicity of apertures each of a size not larger than 0.5 mm in diameter. The screen is mounted sandwiched between the top surface of the metal plate and the pressurizing means. The screen effectively prevents debris of a wafer breakage from entering a vacuum system that is used for holding the wafer on the wafer mounting plate.
    Type: Application
    Filed: December 1, 2000
    Publication date: June 6, 2002
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.,
    Inventors: Yi-Sen Chang, Hsien-Shu Tsai
  • Patent number: 6286948
    Abstract: An ink-jet cartridge with a negative pressure ink reservoir includes a rigid body provided with an ejecting device; an ink reservoir provided within the rigid body, the ink reservoir including two relatively movable plates and a plate body having resilience. The plate body is provided between the two flat plates, and is sealed with the circumferences of the two flat plates to form an enclosed ink reservoir. During ink-jet printing, the pressure within the ink reservoir decreases and the two plates move closer to each other to compress the plate body and the resilience of the plate body causes a negative pressure within the ink reservoir that prevents ink leakage from the ink-jet cartridge.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: September 11, 2001
    Assignee: Wisertek International Corp.
    Inventors: Ji-chen Wu, Shih-hung Lee, Hsien-shu Tsai
  • Patent number: 6213599
    Abstract: An ink cartridge for an ink jet printing device includes a rigid body having an ink chamber for containing ink within the body and an ink output port at one end of the body such that the ink within the ink chamber is output from the output port. A porous transmit medium is placed within the ink chamber and has one end adjacently connected to the ink output port such that the ink within the ink cavity is transmitted to the ink output cavity from the transmit medium by capillary action. The porous transmission medium is in an n-shaped form, including an input end, an output end, and an impermeable sheath between the input end and the output end. Thus, in the process of ink jet printing, at the instant when the ink within the ink output port is ejected, the porous transmit medium transmits the ink to the ink output chamber. As a result, no leakage of ink and smooth ink delivery are achieved. In addition, the structure of the cartridge is simple and assembly is early.
    Type: Grant
    Filed: December 16, 1999
    Date of Patent: April 10, 2001
    Assignee: Wisertek International Corporation
    Inventors: Wen-kang Sung, Ji-chen Wu, Hsien-shu Tsai
  • Patent number: 6145973
    Abstract: The present invention provides any ink jet pen an apparatus for storing and printing ink, wherein a valve is connected between the ink reservoir and the ink chamber for controlling the ink flow between the ink reservoir and the ink chamber and adjusting the air pressure in the ink chamber to keep the pressure in the ink chamber within the allowed range as the ink gradually gets depleted or the environmental pressure changes. The valve having a plunger and a plunger chamber, wherein the plunger chamber is connected to the atmosphere via an atmospheric opening and connected to the ink chamber via a feedback opening which adjusts the pressure in the ink chamber to move the plunger. When a difference between the atmospheric pressure and inner pressure of the ink chamber develops, the plunger will be pushed by the pressure of the atmosphere or the ink chamber to determine whether the ink reservoir is connected to the ink chamber and to adjust the ink chamber inner pressure.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: November 14, 2000
    Assignee: WiserTek International Corp.
    Inventors: Ji-Chen Wu, Hsien-Shu Tsai, Dong-Sang Chiang