Abstract: The present disclosure describes a method of patterning a semiconductor wafer using extreme ultraviolet lithography (EUVL). The method includes receiving an EUVL mask that includes a substrate having a low temperature expansion material, a reflective multilayer over the substrate, a capping layer over the reflective multilayer, and an absorber layer over the capping layer. The method further includes patterning the absorber layer to form a trench on the EUVL mask, wherein the trench has a first width above a target width. The method further includes treating the EUVL mask with oxygen plasma to reduce the trench to a second width, wherein the second width is below the target width. The method may also include treating the EUVL mask with nitrogen plasma to protect the capping layer, wherein the treating of the EUVL mask with the nitrogen plasma expands the trench to a third width at the target width.

Abstract: An optical fiber module is provided and includes an optical fiber structure, a light-absorbing area and a photoelectric sensor in a housing. The optical fiber structure collectively arranges a plurality of first optical fibers to form at least one optical fiber bundle with a tapered end, and a second optical fiber is connected to the tapered end of the optical fiber bundle to converge the optical fiber bundle to the second optical fiber. The light-absorbing area corresponds to an end of the second optical fiber, such that the light-absorbing area absorbs scattering signals escaped and scattered when signals are transmitted from the plurality of first optical fibers to the second optical fiber. The photoelectric sensor is arranged corresponding to the plurality of first optical fibers to receive target signals escaped and refracted when the signals are transmitted from the second optical fiber to the plurality of first optical fibers.

Abstract: A two-stage lens driving device includes a lens holder, a guiding mechanism, and an electromagnetic actuating mechanism. The guiding mechanism is joined with the lens holder for guiding the lens holder moving along an axial direction. The electromagnetic actuating mechanism includes a magnetic induction member, a first coil member, and a second coil member. The magnetic induction member is mounted on and movable with the lens holder. The first and second coil members are respectively located at two tail ends of the magnetic induction member. The first coil member, the magnetic induction member, and the second coil member are arranged linearly parallel to the axial direction. A distance between the coil members is greater than a length of the magnetic induction member along the linear direction. By applying current to one of the coil members, the magnetic induction member is driven to move between the first and the second coil members.

Abstract: The present invention is related to a two-stage lens driving device comprising a lens holder, a guiding machine, an electromagnetic actuating mechanism, and a casing. The guiding mechanism is joined together with the lens holder, and the lens holder is guided by the guiding mechanism for moving linearly along an axial direction. The electromagnetic actuating mechanism has at least one magnetic induction member, at least a first coil member, and at least a second coil member. The magnetic induction member is mounted on the lens holder and moved with the lens holder. The first coil member and the second coil member are respectively located at a position corresponding to each of two tail ends of the magnetic induction member. The first coil member, the magnetic induction member, and the second coil member are approximately arranged along a linear direction parallel to the axial direction.