Patents by Inventor Hsin-Chieh Peng

Hsin-Chieh Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8460427
    Abstract: A method for manufacturing metal nano particles having a hollow structure is provided. First, a suitable reducing agent is added into a first metal salt solution, and first metal ions are reduced to form first metal nano particles. Next, after the reducing agent is decomposed, a second metal salt solution with a higher reduction potential than that of the first metal is added. Then, the first metal particles are oxidized to form first metal ions when the second metal ions are reduced on the surface of the first metal by electrochemical oxidation reduction reaction, and thus, second metal nano particles having a hollow structure and a larger surface area are obtained. The method is simple and the metal nano particles with uniform particle size are obtained by this method.
    Type: Grant
    Filed: October 17, 2007
    Date of Patent: June 11, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Li-Duan Tsai, Kan-Lin Hsueh, Sung-Chun Chang, Man-Yin Lo, Yu-Min Peng, Chun-Chieh Huang, Ru-Shi Liu, Hao-Ming Chen, Hsin-Chieh Peng
  • Patent number: 8305273
    Abstract: A dual-band dual-antenna structure is provided. The dual-band dual-antenna structure comprises a substrate, a first antenna and a second antenna. The substrate comprises a first signal transport layer and a second signal transport layer, wherein the second signal transport layer is not coplanar with the first signal transport layer. The first antenna is disposed on the first signal transport layer and comprises a first U-shaped radiation element and a first polygon radiation element. The first polygon radiation element is disposed in an opening of the first U-shaped radiation element. The second antenna is disposed on the second signal transport layer but does not overlap under the first antenna. The second antenna comprises a second U-shaped radiation element and a second polygon radiation element. The second polygon radiation element is disposed in an opening of the second U-shaped radiation element.
    Type: Grant
    Filed: August 16, 2010
    Date of Patent: November 6, 2012
    Assignee: Arcadyan Technology Corporation
    Inventors: Shih-Chieh Cheng, Hsin-Chieh Peng
  • Publication number: 20110037660
    Abstract: A dual-band dual-antenna structure is provided. The dual-band dual-antenna structure comprises a substrate, a first antenna and a second antenna. The substrate comprises a first signal transport layer and a second signal transport layer, wherein the second signal transport layer is not coplanar with the first signal transport layer. The first antenna is disposed on the first signal transport layer and comprises a first U-shaped radiation element and a first polygon radiation element. The first polygon radiation element is disposed in an opening of the first U-shaped radiation element. The second antenna is disposed on the second signal transport layer but does not overlap under the first antenna. The second antenna comprises a second U-shaped radiation element and a second polygon radiation element. The second polygon radiation element is disposed in an opening of the second U-shaped radiation element.
    Type: Application
    Filed: August 16, 2010
    Publication date: February 17, 2011
    Applicant: Arcadyan Technology Corporation
    Inventors: Shih-Chieh CHENG, Hsin-Chieh Peng
  • Publication number: 20090035575
    Abstract: A method for manufacturing metal nano particles having a hollow structure is provided. First, a suitable reducing agent is added into a first metal salt solution, and first metal ions are reduced to form first metal nano particles. Next, after the reducing agent is decomposed, a second metal salt solution with a higher reduction potential than that of the first metal is added. Then, the first metal particles are oxidized to form first metal ions when the second metal ions are reduced on the surface of the first metal by electrochemical oxidation reduction reaction, and thus, second metal nano particles having a hollow structure and a larger surface area are obtained. The method is simple and the metal nano particles with uniform particle size are obtained by this method.
    Type: Application
    Filed: October 17, 2007
    Publication date: February 5, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Li-Duan Tsai, Kan-Lin Hsueh, Sung-Chun Chang, Man-Yin Lo, Yu-Min Peng, Chun-Chieh Huang, Ru-Shi Liu, Hao Ming Chen, Hsin-Chieh Peng