Patents by Inventor Hsin-Hsu Lin

Hsin-Hsu Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11924984
    Abstract: A display including a screen, a bracket, a hanging element and a fixing element is provided. The support is connected to the screen and has a top end and a bottom end. The hanging element is disposed on the top end. The fixing element is disposed at the bottom end. When the hanging element is hung on an upper edge of a plate, the fixing element is fixed on a surface of the plate.
    Type: Grant
    Filed: February 10, 2022
    Date of Patent: March 5, 2024
    Assignee: Qisda Corporation
    Inventors: Jen-Feng Chen, Yien-Bo Chen, Kuan-Hsu Lin, Hsin-Hung Lin, Nien-Tsung Hsu
  • Patent number: 11551955
    Abstract: A substrate processing apparatus includes a process station for processing a substrate; a cassette station integrated with the process station; a substrate carriage equipped for transferring the substrate between said process station and the cassette station through a passage located at an interface between the process station and said cassette station; and a substrate scanner equipped at said interface between the process station and the cassette station for capturing surface image data during transportation of the substrate that passes through the passage.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: January 10, 2023
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Ming-Che Lai, Hua-Wei Peng, Chia-He Cheng, Ming-Tso Chen, Chao-Chi Lu, Hsin-Hsu Lin, Kuo-Tsai Lo, Kao-Hua Wu, Huan-Hsin Yeh
  • Publication number: 20210280444
    Abstract: A substrate processing apparatus includes a process station for processing a substrate; a cassette station integrated with the process station; a substrate carriage equipped for transferring the substrate between said process station and the cassette station through a passage located at an interface between the process station and said cassette station; and a substrate scanner equipped at said interface between the process station and the cassette station for capturing surface image data during transportation of the substrate that passes through the passage.
    Type: Application
    Filed: March 26, 2020
    Publication date: September 9, 2021
    Inventors: Ming-Che Lai, Hua-Wei Peng, Chia-He Cheng, Ming-Tso Chen, Chao-Chi Lu, Hsin-Hsu Lin, Kuo-Tsai Lo, Kao-Hua Wu, Huan-Hsin Yeh
  • Publication number: 20190081419
    Abstract: A connector assembly includes a connector that includes a front circuit board disposed within a front housing portion, and a rear circuit board disposed within a rear housing portion assembled to the front housing portion. Flexible electrically conductive traces provide electrical communication between the front and rear circuit boards. The rear housing portion is rotatable about a rotational axis relative to the front housing portion to change a relative orientation of the front and rear circuit boards and provide various cable exit types.
    Type: Application
    Filed: February 22, 2017
    Publication date: March 14, 2019
    Inventors: Shuo-Hsuan Hsieh, Hsin-Hsu Lin
  • Patent number: 7413848
    Abstract: A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the photoresist layer. The first solution and the second solution have different polarities, and the polarity of the first solution is large than that of the second solution.
    Type: Grant
    Filed: July 27, 2005
    Date of Patent: August 19, 2008
    Assignee: United Microelectronics Corp.
    Inventors: Lien-Sheng Chung, Chi-Hung Wei, Hsin-Hsu Lin
  • Publication number: 20070026340
    Abstract: A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the photoresist layer. The first solution and the second solution have different polarities, and the polarity of the first solution is large than that of the second solution.
    Type: Application
    Filed: July 27, 2005
    Publication date: February 1, 2007
    Inventors: Lien-Sheng Chung, Chi-Hung Wei, Hsin-Hsu Lin