Patents by Inventor Hsin-Hung Ting

Hsin-Hung Ting has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a semiconductor structure
    Patent number: 10431492
    Abstract: A method of manufacturing a semiconductor structure includes forming a lower hard mask layer on a substrate. A patterned middle hard mask layer is formed on the lower hard mask layer, and the patterned middle hard mask layer has a plurality of openings exposing a portion of the lower hard mask layer. A patterned lower hard mask layer and a textured substrate having a plurality of trenches are formed by etching the exposed portion of the lower hard mask layer and a portion of the substrate under the exposed portion of the lower hard mask layer. A steam treatment is then performed on the textured substrate having the trenchess. An isolation oxide layer is formed to fill the trenches.
    Type: Grant
    Filed: May 28, 2018
    Date of Patent: October 1, 2019
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Shing-Yih Shih, Hsin-Hung Ting