Patents by Inventor Hsin-Jung Li

Hsin-Jung Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240170299
    Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.
    Type: Application
    Filed: January 30, 2024
    Publication date: May 23, 2024
    Inventors: KUN-JU LI, ANG CHAN, HSIN-JUNG LIU, WEI-XIN GAO, JHIH-YUAN CHEN, CHUN-HAN CHEN, ZONG-SIAN WU, CHAU-CHUNG HOU, I-MING LAI, FU-SHOU TSAI
  • Patent number: 11923205
    Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: March 5, 2024
    Assignee: UNITED MICROELECTRONICS CORPORATION
    Inventors: Kun-Ju Li, Ang Chan, Hsin-Jung Liu, Wei-Xin Gao, Jhih-Yuan Chen, Chun-Han Chen, Zong-Sian Wu, Chau-Chung Hou, I-Ming Lai, Fu-Shou Tsai
  • Publication number: 20240071988
    Abstract: A method for manufacturing a semiconductor structure is provided. The method includes: providing a substrate and a dielectric layer on the substrate; forming a hole in the dielectric layer; forming an initial barrier material layer and a conductive layer on an upper surface of the dielectric layer and in the hole; removing part of the initial barrier material layer and part of the conductive layer to form a barrier material layer and a via element in the hole respectively and expose the upper surface of the dielectric layer. An upper surface of the barrier material layer is higher than the upper surface of the dielectric layer.
    Type: Application
    Filed: October 11, 2022
    Publication date: February 29, 2024
    Inventors: Kun-Ju LI, Hsin-Jung LIU, Wei-Xin GAO, Jhih-Yuan CHEN, Ang CHAN, Chau-Chung HOU
  • Publication number: 20210260065
    Abstract: In one aspect, methods of treating bacterial infections are described herein employing compounds having more than one target for antibacterial activity. Additionally, pharmaceutical compositions comprising such compounds are also described.
    Type: Application
    Filed: May 7, 2021
    Publication date: August 26, 2021
    Inventors: Zemer Gitai, James MARTIN, Hsin-Jung LI, Max WILSON, Hahn KIM
  • Patent number: 11077109
    Abstract: In one aspect, methods of treating bacterial infections are described herein employing compounds having more than one target for antibacterial activity. Additionally pharmaceutical compositions comprising such compounds are also described.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: August 3, 2021
    Assignee: THE TRUSTEES OF PRINCETON UNIVERSITY
    Inventors: Zemer Gitai, James Martin, Hsin-Jung Li, Max Wilson, Hahn Kim
  • Publication number: 20190201401
    Abstract: In one aspect, methods of treating bacterial infections are described herein employing compounds having more than one target for antibacterial activity. Additionally pharmaceutical compositions comprising such compounds are also described.
    Type: Application
    Filed: August 1, 2018
    Publication date: July 4, 2019
    Inventors: Zemer Gitai, James Martin, Hsin-Jung Li, Max Wilson, Hahn Kim