Patents by Inventor Hsin Lan Pang

Hsin Lan Pang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay Measurement Target
    Publication number: 20080217794
    Abstract: In an overlay metrology method used during semiconductor device fabrication, an overlay alignment mark facilitates alignment and/or measurement of alignment error of two layers on a semiconductor wafer structure, or different exposures on the same layer. A target is small enough to be positioned within the active area of a semiconductor device combined with appropriate measurement methods, which result in improved measurement accuracy.
    Type: Application
    Filed: May 22, 2008
    Publication date: September 11, 2008
    Applicants: Industrial Technology Research Institute, Nanometrics Incorporated
    Inventors: Nigel Peter Smith, Yi-Sha Ku, Hsin Lan Pang
  • Overlay measurement target
    Patent number: 7379184
    Abstract: In an overlay metrology method used during semiconductor device fabrication, an overlay alignment mark facilitates alignment and/or measurement of alignment error of two layers on a semiconductor wafer structure, or different exposures on the same layer. A target is small enough to be positioned within the active area of a semiconductor device combined with appropriate measurement methods, which result in improved measurement accuracy.
    Type: Grant
    Filed: January 13, 2005
    Date of Patent: May 27, 2008
    Assignees: Nanometrics Incorporated, Industrial Research Technology Institute
    Inventors: Nigel Peter Smith, Yi-Sha Ku, Hsin Lan Pang