Patents by Inventor Hsin Liu

Hsin Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mitigating long-term energy decay of laser devices
    Patent number: 11720035
    Abstract: In order to prevent observed long-term energy decay of power amplifiers and correspondingly increase the lifespan of CO2 lasers employing them, a hydrogen-doped mixing gas is supplied from an external pipeline during operation or periodic maintenance in order to effectively remove solid contaminants that build-up over time on a surface of a catalyst disposed within the power amplifier.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: August 8, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Ping Yen, Yen-Shuo Su, Jui-Pin Wu, Chun-Lin Chang, Han-Lung Chang, Heng-Hsin Liu
  • Modified Nano-Silica Gel for Improving Symptoms Caused by Bacteria and Viruses and Preparation Method and Application Thereof
    Publication number: 20230226104
    Abstract: A modified nano-silica gel for improving symptoms caused by bacteria and viruses and a preparation method and an application thereof. The patented nano-silica gel is modified by a modified compound to obtain a modified nano-silica gel to effectively reduce an amount of toxins excreted by sows, thereby providing piglets with a safe environment that is more suitable for survival. The modified nano-silica gel of the invention comprises: a nano-silica gel with a content of 13.0-92.3 wt %; a modified compound with a content of 0.15-3.50 wt %, the modified compound is an organic compound, a weight ratio of the nano-silica gel to the modified compound is 620:1 to 3.5:1; and water with a formula of H2O and a content of 7.5-86.8 wt %; the nano-silica gel, the modified compound and the water are stirred and mixed at a temperature of 40-80° C. to prepare the modified nano-silica gel.
    Type: Application
    Filed: January 19, 2022
    Publication date: July 20, 2023
    Inventors: Te-Hsin LIU, Wei-Lung YU
  • APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
    Publication number: 20230225039
    Abstract: A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.
    Type: Application
    Filed: March 6, 2023
    Publication date: July 13, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yu-Huan CHEN, Yu-Chih HUANG, Ming-Hsun TSAI, Shang-Chieh CHIEN, Heng-Hsin LIU
  • ELECTRONIC DEVICE AND SCREEN CONTROL METHOD THEREOF
    Publication number: 20230221768
    Abstract: An electronic device is provided, including a flexible display element, an extending mechanism, a memory, an input unit, and a control unit. The extending mechanism is coupled to the flexible display element and configured to extend the flexible display element along a first direction. The memory stores a program list. The input unit receives an enable signal, where the enable signal corresponds to an application program. The control unit is electrically coupled to the flexible display element, the memory, and the input unit and is configured to determine whether the application program is included in the program list or not; and control, when the application program is included in the program list, the extending mechanism to extend the flexible display element along the first direction. The disclosure further provides a screen control method.
    Type: Application
    Filed: December 1, 2022
    Publication date: July 13, 2023
    Inventors: Chien-Hsin LIU, Yihsuan LEE
  • SYSTEMS AND METHODS FOR ASSISTING PHYSICAL EXERCISES
    Publication number: 20230218973
    Abstract: A physical exercise assistant system and method are disclosed. The physical exercise assistant system includes a pattern generator, a pattern marker, and a user interface. The pattern generator is configured to generate a plurality of geometric patterns. The pattern marker is coupled to the pattern generator and configured to produce a first one of the plurality of geometric patterns on a ground. The user interface is configured to display the plurality of geometric patterns and receive an input for selecting the first one of the plurality of geometric patterns.
    Type: Application
    Filed: January 11, 2022
    Publication date: July 13, 2023
    Applicant: WISTRON CORPORATION
    Inventors: Yi Hung TUNG, Ping Hsin LIU, Ming Chih YEN, Tai Hsuan CHIU, Siao Yun YANG
  • EUV LITHOGRAPHY APPARATUS
    Publication number: 20230215594
    Abstract: An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
    Type: Application
    Filed: March 13, 2023
    Publication date: July 6, 2023
    Inventors: Cheng Hung TSAI, Sheng-Kang Yu, Shang-Chieh Chien, Heng-Hsin Liu, Li-Jul Chen
  • System and method for detecting debris in a photolithography system
    Patent number: 11693324
    Abstract: An extreme ultraviolet (EUV) photolithography system detects debris travelling from an EUV generation chamber to a scanner. The photolithography system includes a detection light source and a sensor. The detection light source outputs a detection light across a path of travel of debris particles from the EUV generation chamber. The sensor senses debris particles by detecting interaction of the debris particles with the detection light.
    Type: Grant
    Filed: September 24, 2021
    Date of Patent: July 4, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Yu Tu, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • Radiation source apparatus and method for using the same
    Patent number: 11694820
    Abstract: A radiation source apparatus includes a vessel, a laser source, a collector, and a reflective mirror. The vessel has an exit aperture. The laser source is at one end of the vessel and configured to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The reflective mirror is in the vessel and configured to reflect the laser beam toward an edge of the vessel.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: July 4, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chung Tu, Sheng-Kang Yu, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • System and method for dynamically controlling temperature of thermostatic reticles
    Patent number: 11693326
    Abstract: A system and method for dynamically controlling a temperature of a thermostatic reticle. A thermostatic reticle assembly that includes a reticle, temperature sensors located in proximity to the reticle, and one or more heating elements. A thermostat component that is in communication with the temperature sensors and the heating element monitors the current temperature of the reticle relative to a steady-state temperature. In response to the current temperature of the reticle being lower than the steady-state temperature, the heating elements are activated to preheat the reticle to the steady-state temperature.
    Type: Grant
    Filed: March 11, 2022
    Date of Patent: July 4, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Jung Pan, Sheng-Kang Yu, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • IMAGING LENS, LIGHT BLOCKING SHEET AND ELECTRONIC DEVICE
    Publication number: 20230204828
    Abstract: An imaging lens includes a lens element, a light blocking sheet, and a lens barrel accommodating the lens element and the light blocking sheet. The light blocking sheet includes a first object-side surface, a first image-side surface, a first inner ring surface, a first microstructure, and a first nanostructure layer. The first image-side surface is opposite to the first object-side surface. The first inner ring surface is located between the first object-side surface and the first image-side surface and defines a first light passage opening. The first microstructure is disposed on the first object-side surface or the first image-side surface. The first microstructure has a plurality of protrusions. The first nanostructure layer is disposed on the first inner ring surface. The first nanostructure layer has a plurality of ridge-like protrusions extending non-directionally.
    Type: Application
    Filed: May 27, 2022
    Publication date: June 29, 2023
    Applicant: LARGAN PRECISION CO., LTD.
    Inventors: Chien-Pang CHANG, Chen Wei FAN, Ssu-Hsin LIU, Wen-Yu TSAI, Ming-Ta CHOU
  • Tangential flow filtration module and tangential flow filtration assembly
    Patent number: 11684874
    Abstract: A tangential flow filtration module includes plural plate units connected in sequence. Each of the plate units includes a main body, a first combing portion, a second combing portion, a first flange and a second flange. The main body has a first side surface, a second side surface and a through hole. The first side surface is opposite to the second side surface, and the through hole extends from the first side surface to the second side surface. The first combing portion and the second combing portion are disposed on the first side surface and the second side surface respectively. The first flange and the second flange respectively protrude from the first side surface and the second side surface and respectively. The first combing portion of one of the plate units is combined with the second combing portion of another one of the plate units, so that a sieving structure.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: June 27, 2023
    Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE
    Inventors: Zheng-Han Hong, Chun-Mu Wu, Zong-Hsin Liu, Po-Han Tseng, Yao-Kun Haung
  • Noise management during an online conference session
    Patent number: 11688384
    Abstract: Managing noise during an online conference session includes obtaining audio data from an endpoint participating in an online conference session. The audio data is derived from audio captured at the endpoint that includes musical sounds. The audio data is processed to identify a portion of the audio data in which a decibel level of the musical sounds is stable for a period of time. Non-musical noise present, if any, in the audio data with the musical sounds is identified and the non-musical noise is attenuated from the audio data to generate noise-reduced musical audio data. The noise-reduced musical audio data is transmitted for play out at one or more other endpoints participating in the online conference session.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: June 27, 2023
    Assignee: CISCO TECHNOLOGY, INC.
    Inventors: Bjørn Winsvold, Eric Yi-hua Chen, Wei-Lien Hsu, Pi-Hsin Liu
  • Mask for attracting charged particles and method for using the same
    Patent number: 11681234
    Abstract: A method includes transporting a cleaning mask and a photomask into an enclosure of a lithography exposure apparatus, wherein the photomask includes a multilayered mirror structure, and the cleaning mask is free of the multilayered mirror structure; placing the cleaning mask on a reticle stage of the lithography exposure apparatus; and charging the cleaning mask to attract charged particles in the enclosure.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: June 20, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-An Chen, Li-Jui Chen, Heng-Hsin Liu, Tzung-Chi Fu, Han-Lung Chang
  • METHOD AND SYSTEM FOR GENERATING DROPLETS FOR EUV PHOTOLITHOGRAPHY PROCESSES
    Publication number: 20230189422
    Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
    Type: Application
    Filed: December 12, 2022
    Publication date: June 15, 2023
    Inventors: Yu-Kuang SUN, Cheng-Hao LAI, Yu-Huan CHEN, Wei-Shin CHENG, Ming-Hsun TSAI, Hsin-Feng CHEN, Chiao-Hua CHENG, Cheng-Hsuan WU, Yu-Fa LO, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
  • Method and apparatus for mitigating contamination
    Patent number: 11675272
    Abstract: Supersonic gas jets are provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by the lithography process away from a scanner side and towards a debris collection device. The gas jets can be positioned in a variety of useful orientations, with adjustable gas flow velocity and gas density in order to prevent up to nearly 100% of the tin debris from migrating to the reticle on the scanner side.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: June 13, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Ping Yen, Yen-Shuo Su, Chieh Hsieh, Shang-Chieh Chien, Chun-Lin Chang, Li-Jui Chen, Heng-Hsin Liu
  • High voltage resistor with high voltage junction termination
    Patent number: 11676997
    Abstract: High voltage semiconductor devices are described herein. An exemplary semiconductor device includes a first doped region and a second doped region disposed in a substrate. The first doped region and the second doped region are oppositely doped and adjacently disposed in the substrate. A first isolation structure and a second isolation structure are disposed over the substrate, such that each are disposed at least partially over the first doped region. The first isolation structure is spaced apart from the second isolation structure. A resistor is disposed over a portion of the first isolation structure and electrically coupled to the first doped region. A field plate disposed over a portion of the second doped region and electrically coupled to the second doped region.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: June 13, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ru-Yi Su, Fu-Chih Yang, Chun Lin Tsai, Chih-Chang Cheng, Ruey-Hsin Liu
  • High dynamic range technique selection for image processing
    Patent number: 11671715
    Abstract: A device for camera processing is configured to receive a preview image, and determine if the preview image is a high dynamic range (HDR) scene based on brightness values of pixels of the preview image. The device may further determine to use a single frame image capture technique based on a determination that the preview image is not an HDR scene, and determine to use one of a plurality of HDR image capture techniques based on a determination that the preview image is an HDR scene, and further based on motion detected in the preview image. The device may then generate an output image using one or more images captured using the single frame image capture technique or one of the plurality of HDR image capture techniques.
    Type: Grant
    Filed: January 14, 2021
    Date of Patent: June 6, 2023
    Assignee: QUALCOMM Incorporated
    Inventors: Tai-Hsin Liu, Wen-Chun Feng, Wei-Chih Liu, Jun-Zuo Liu
  • Systems, devices and methods for amplification of signals based on a cycling excitation process in disordered materials
    Patent number: 11670731
    Abstract: Methods, systems, and devices are disclosed for low noise and high efficiency photoelectric amplification based on cycling excitation process (CEP). In some aspects, a device for amplifying signals of light-induced photocurrent includes an anode connected to a positive terminal of a voltage source; a disordered material layer coupled to the anode, wherein the disordered material layer is structured to have a thickness of 100 nm or less; and a cathode coupled to the disordered material layer and connected to a negative terminal of the voltage source, in which the device is operable to amplify photoexcited carriers based on photon absorption to produce an external quantum efficiency of the device that is at least 100%.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: June 6, 2023
    Assignee: The Regents of the Unversity of California
    Inventors: Yu-Hwa Lo, David Hall, Yu-Hsin Liu, Zihan Xu, Lujiang Yan
  • Image lens assembly, image capturing unit and electronic device
    Patent number: 11668898
    Abstract: An image lens assembly includes five lens elements which are, in order from an object side to an image side along an optical path: a first lens element, a second lens element, a third lens element, a fourth lens element and a fifth lens element. The first lens element has positive refractive power. The second lens element with positive refractive power has an image-side surface being convex in a paraxial region thereof. The fourth lens element with positive refractive power has an object-side surface being convex in a paraxial region thereof and having at least one concave critical point in an off-axis region thereof. The fifth lens element has an image-side surface being concave in a paraxial region thereof and having at least one convex critical point in an off-axis region thereof.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: June 6, 2023
    Assignee: LARGAN PRECISION CO., LTD.
    Inventors: Yu-Chun Ke, Jin Sen Wang, Ssu-Hsin Liu, Wei-Yu Chen
  • Preparation method and analysis method of monolayer two-dimensional materials
    Publication number: 20230168214
    Abstract: A preparation method of monolayer two-dimensional materials, including the following steps: providing a metal acetate dihydrate, with a general formula M(CH3COO)2.2H2O, in which M may be metal ion cadmium or zinc. Dissolving the metal acetate dihydrate in ethylene diamine and heating to 60° C. for two hours to form a metal cation precursor solution. Providing a chalcogen element powder, in which the chalcogen element powder is selected from sulfur, selenium, or tellurium. Dissolving the chalcogen element powder and sodium borohydride in ethylene diamine, and standing at room temperature for 24 hours to form a chalcogenide-amine precursor solution. Mixing the metal cation precursor solution with the chalcogenide-amine precursor solution to form a mixed solution. Transferring the mixed solution in a high temperature autoclave for reaction to form the monolayer two-dimensional materials.
    Type: Application
    Filed: February 11, 2022
    Publication date: June 1, 2023
    Inventors: YI-HSIN LIU, KAI-CHUN CHUANG, CHI LI, SHENG-CHIH HSU