Abstract: A reticle pod with antistatic capability includes a base and plural of support members. The base has a carrying surface having a recess formed thereon and defined by a bottom surface. The support members encircle the carrying surface of the base and are adapted to support a reticle. The recess is defined by a depth extending between the carrying surface and the bottom surface. The depth ranges from 300 ?m to 3400 ?m to thereby weaken the electrostatic force exerted upon particles on the carrying surface.

Abstract: The invention discloses a substrate storage apparatus having a detecting device detachably connecting to an outer pod. The detecting device includes a sensing member having a sensing terminal, a cavity and a sensor. The sensing terminal detachably connects to the outer pod such that the sensing terminal exposes in an accommodating space inside of the outer pod. The cavity receiving the sensor extends to an outside of the outer pod and the accommodating space. The cavity communicates with the accommodating space through the sensing terminal, allowing the sensor to read information regarding the accommodating space.

Abstract: The instant disclosure discloses a workpiece container system comprising a storage assembly that comprises a seat member. The seat member has a storage portion that defines a longitudinal axis through a geometric center region thereof, provided with a workpiece receiving region that encompasses the geometric center region and configured to receive a workpiece. The seat member has a pair of flank portions arranged on opposite sides of the storage portion along the longitudinal axis, each having a thickness thinner than that of the storage portion. A diffuse inducing component is provided on the storage portion in the workpiece receiving region yet offsets the geometric center region thereof.

Abstract: The invention discloses a reticle pod for receiving a reticle. The reticle pod includes a base and plural support device provided on the base for supporting the reticle. A first distance is defined between a peripheral area of a bottom surface of the reticle and an upward facing top surface of the base. A second distance is defined between a central area of the bottom surface of the base and the upward facing top surface of the base, wherein the central area is encircled by the peripheral area. The second distance is larger than the first distance.

Abstract: The instant disclosure discloses a workpiece container system comprising a storage assembly. The storage assembly comprises a seat member and a seat cover. The seat member defines a workpiece receiving region that encompasses a geometric center region thereof, configured to receive a workpiece; wherein a lower diffuse inducing component is provided on the seat member within a planar projection of the workpiece yet offsets the geometric center region. The seat cover is configured to engage the seat member at a periphery region around the workpiece receiving region thereof, so as to cooperatively form an enclosure for housing the workpiece; wherein an upper diffuse inducing component is provided on the seat cover over the planar projection of the workpiece and protectively overlaps the geometric center region of the seat member.

Abstract: A reticle pod cleansing apparatus includes a cavity, a gas injection unit, a dust counting unit and a control unit. The cavity has a chamber, an inlet opening in communication with the chamber, and an outlet opening in communication with the chamber. The gas injection unit is disposed at the chamber and is in communication with an inlet device through the inlet opening to inject gas into the chamber. The dust counting unit is in communication with the outlet opening to receive gas discharged from the outlet opening and calculate dust quantity of the gas discharged. The control unit is in signal communication with dust counting unit and adapted to send a signal when the calculated dust quantity is less than a predetermined threshold. During a cleansing process, the reticle pod cleansing apparatus detects precisely and instantly whether a reticle pod being cleansed has been sufficiently cleansed or not.

Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.

Abstract: A reticle pod having a positioning member includes a base, a lid and a plurality of positioning members. The lid shuts relative to the base to form a substantially cuboid case. The case has a storing space for receiving a reticle. The positioning members are arranged in a shutting direction and disposed on at least two edges of the lid or at least two edges of the base, respectively. The positioning members each include a connecting portion, a correcting portion and a guiding slope portion. The connecting portion connects the edges of the lid. The correcting portion has one end connected to the connecting portion and extending in a shutting direction and an opposing end connected to the guiding slope portion. The guiding slope portion has a slope extending outward. The reticle pod having a positioning member is error-free, allowing the lid to shut precisely relative to the base.

Abstract: The instant disclosure discloses a reticle retaining system comprising an inner pod and an outer pod. The inner pod is configured to receive a reticle that includes a first identification feature. The inner pod comprises an inner base having a reticle accommodating region generally at a geometric center thereof and surrounded by a periphery region, and an inner cover configured to establish sealing engagement with the inner base. The inner base has a first observable zone defined in the reticle accommodating region correspondingly arranged to allow observation of the first identification feature. The outer pod is configured to receive the inner base. The outer pod comprises an outer base having a second observable zone defined thereon observably aligned to the first observable zone of the inner pod upon receiving the inner pod, and an outer cover configured to engage the outer base and cover the inner pod.

Abstract: The invention discloses a reticle pod having a lid and multiple pin assemblies. The pin assembly includes a movable member movable relatively to a ceiling of the lid and an elastic member configured to arrange the movable member in between the elastic member and the ceiling of the lid. In the case where the reticle pod is provided without receiving a reticle, the ceiling of the reticle pod determines the movable member stays at a first level. In the case where the reticle pod is provided with a reticle, the elastic member collaborates with the movable member such that the movable member holds the reticle at a second level that is higher than the first level.

Abstract: The invention discloses a container for accommodating a substrate. The container includes a base having at least one first supporting surface and a lid having at least one second supporting surface to engage with the first supporting surface of the base, so as to define an accommodating space for the substrate. The first supporting surface of the base and the second supporting surface of the lid have the same slope with a respective flatness of 0.04 mm or less, so that an effective hermetic seal between the first supporting surface and the second supporting surface is formed when the two surfaces contact each other.

Abstract: The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface having at least one first mark and at least one second mark. The first mark has a first reflectivity relative to a light source, and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity, and both are also different from that of the rest area of the bottom surface.

Abstract: A reticle pod includes a body, cover, sliding-rail member, sliding-fastening member and shut-corresponding element. The sliding-rail member has a dent portion and a slot portion and defines a locked direction. The dent portion extends from the slot portion in the locked direction. The sliding-fastening member is slidably disposed at the sliding-rail member. The sliding-fastening member has a fastening portion and resilient arms. The resilient arms are inserted into a slot of the slot portion. The fastening portion has a fastening groove corresponding in height to the slot portion. An oblique-guide surface is disposed above the fastening groove. When the cover switches from an open state to a closed state, the shut-corresponding element pushes the sliding-fastening member across the oblique-guide surface and thus compresses the sliding-fastening member, allowing the shut-corresponding element to enter the fastening groove.

Abstract: A method for containing a reticle in a pod is provided. The method includes opening the pod such that a pressing element retained movably on the pod by a limiting cap moves to a first position, wherein a shoulder part of the pressing element between a pressure receiving part and a pressing part of the pressing element is spaced from the limiting cap. The method further includes placing the reticle in the pod such that the reticle is pressed by the pressing element.

Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

Abstract: A reticle pod includes a body, cover, sliding-rail member, sliding-fastening member and shut-corresponding element. The sliding-rail member has a dent portion and a slot portion and defines a locked direction. The dent portion extends from the slot portion in the locked direction. The sliding-fastening member is slidably disposed at the sliding-rail member. The sliding-fastening member has a fastening portion and resilient arms. The resilient arms are inserted into a slot of the slot portion. The fastening portion has a fastening groove corresponding in height to the slot portion. An oblique-guide surface is disposed above the fastening groove. When the cover switches from an open state to a closed state, the shut-corresponding element pushes the sliding-fastening member across the oblique-guide surface and thus compresses the sliding-fastening member, allowing the shut-corresponding element to enter the fastening groove.

Abstract: A reticle storage device includes a top lid having a ceiling and a cover surrounding the ceiling, and a bottom lid having a carrier and a peripheral structure surrounding the carrier. When the top lid engages with the bottom lid, a passage is defined therebetween and therefore the reticle storage device is not sealed.

Abstract: A reticle pressing unit and an EUV reticle pod using the same are provided. An inner assembly includes an upper cover and a lower cover. The lower cover includes a supporting element for supporting the reticle. A pressing unit for pressing the reticle is disposed on the upper cover and includes a pressing element and a limiting cap. The pressing element has oppositely arranged pressing part and pressure receiving part. The pressing part extends through the upper cover to press against the reticle. The pressing element is covered by the limiting cap and is protruded outwardly from a top surface of the limiting cap. An outer cover has a pushing surface for forming a surface-to-surface contact with the pressure receiving part and for simultaneously pressing against the pressure receiving part and the top surface to solve the problems relating to the reticle which is applied with uneven forces.

Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

Abstract: A reticle retaining system comprising an inner pod and an outer pod. The inner pod comprises an inner base and an inner cover configured to couple to the inner base thereby forming an interior for housing a received workpiece, and a hold down pin movably arranged through the inner cover and configured to press the received workpiece. The outer pod comprises an outer base configured to receive the inner base, an outer cover, and a pushing element. Wherein the hold down pin, the outer cover and the pushing element have charge dissipation property. When the pushing element pushes the hold down pin to press the workpiece, a charge dissipation path from the received workpiece, through the hold down pin and the pushing element, to the outer cover is established.