Abstract: A display panel with reduced short-wavelength blue light is provided and includes a backlight module and an LCD panel. The backlight module includes a plurality of LEDs, each of which includes a blue LED die configured to emit blue light with a peak wavelength ranging from 455 to 475 nm. The present invention may efficiently reduce blue light with wavelengths less than 455 nm to protect eyes, and may not reduce display brightness and encounter color aberration. Moreover, the backlight module may further include an optical filter sheet or film configured to filter blue light with wavelengths less than 455 nm, and may further reduce blue light with wavelengths less than 455 nm to protect eyes more while modulating reduced display brightness and reduce color aberration.

Abstract: Disclosed herein is a method for manufacturing a catalyst. The catalyst includes a mesoporous support and a plurality of metal nanoparticles dispersed and positioned in the mesopores of the mesoporous support. The method comprises the steps of: (a1)) allowing an organometallic precursor to be in contact with a mesoporous support, in which the organometallic precursor includes at least one material selected from the group consisting of ruthenium-containing compound, rhodium-containing compound and palladium-containing compound; and (a2) reducing the organometallic precursor in the presence of a supercritical fluid with a reductant, so that the organometallic precursor is reduced to the metal nanoparticles.

Abstract: A shielding layer outside a sensing region I of a CMOS image sensor includes a stack of a first monochromatic color filter layer and a second monochromatic color filter layer. Such a two-layered monochromatic color filter acts as a shielding layer, and the amount of black photoresist needed is decreased. Therefore, a process of CMOS image sensor fabrication is simplified and the cost of fabrication is decreased. The black pigment is prevented from remaining and causing contamination.

Abstract: An assessing mark of microlens array fabricated in a scribe line region includes two vertical line patterns arranged substantially in parallel with each other, and a horizontal line pattern connecting the vertical line patterns. The vertical line patterns and horizontal line pattern define an inner index path. When treated by baking process, the two vertical line patterns are fluidized due to heat and partially merge together from the horizontal line pattern of the assessing mark along the inner index path.

Abstract: A shielding layer outside a sensing region I of a CMOS image sensor includes a stack of a first monochromatic color filter layer and a second monochromatic color filter layer. Such a two-layered monochromatic color filter acts as a shielding layer, and the amount of black photoresist needed is decreased. Therefore, a process of CMOS image sensor fabrication is simplified and the cost of fabrication is decreased. The black pigment is prevented from remaining and causing contamination.

Abstract: An assessing mark of microlens array fabricated in a scribe line region includes two vertical line patterns arranged substantially in parallel with each other, and a horizontal line pattern connecting the vertical line patterns. The vertical line patterns and horizontal line pattern define an inner index path. When treated by baking process, the two vertical line patterns are fluidized due to heat and partially merge together from the horizontal line pattern of the assessing mark along the inner index path.

Abstract: A manufacturing method of a color filter film and an image sensor device is provided. The manufacturing method of the color filter film, comprises forming a color filter material layer over a substrate. Then, a segregation layer is formed over the color filter material layer to reduce a component of the color filter material layer from escaping. Thereafter, a patterning process is performed over the color filter material layer to form a color filter pattern, wherein a segregation layer is removed during the patterning process. Accordingly, since a segregation layer is formed over the color filter material layer before the patterning process is performed, the problem of contamination of the apparatus due to the escape of the component of the color filter material layer during the patterning process is reduced.