Patents by Inventor Hsing-Chia Wang

Hsing-Chia Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Remover solution composition and use thereof
    Publication number: 20070225188
    Abstract: The invention provides a remover solution composition, comprising: (A) 0˜25% by weight of an alkaline compound; (B) 0.1˜20% by weight of an alcohol amine compound; (C) 0.5˜20% by weight of a surfactant; (D) 3˜80% by weight of a water-miscible solvent; and (E) water. The remover solution composition of the invention is suitable for removing unnecessary photoresists or planarization materials on edges of substrates of display panels or color filters.
    Type: Application
    Filed: March 20, 2007
    Publication date: September 27, 2007
    Inventor: Hsing-Chia Wang