Abstract: A chip package includes a semiconductor substrate and a metal layer. The semiconductor substrate has an opening and a sidewall surrounding the opening, in which an upper portion of the sidewall is a concave surface. The semiconductor substrate is made of a material including silicon. The metal layer is located on the semiconductor substrate. The metal layer has plural through holes above the opening to define a MEMS (Microelectromechanical system) structure, in which the metal layer is made of a material including aluminum.

Abstract: A chip package includes a semiconductor substrate and a metal layer. The semiconductor substrate has an opening and a sidewall surrounding the opening, in which an upper portion of the sidewall is a concave surface. The semiconductor substrate is made of a material including silicon. The metal layer is located on the semiconductor substrate. The metal layer has plural through holes above the opening to define a MEMS (Microelectromechanical system) structure, in which the metal layer is made of a material including aluminum.

Abstract: An optical chip package is provided. The optical chip package includes a first transparent substrate, a second transparent substrate, and a spacer layer. The first and second transparent substrates each has a first surface and a second surface opposite the first surface. The first transparent substrate has a thickness that is different than that of the second transparent substrate. The second transparent substrate is disposed over the first transparent substrate, and the spacer layer is bonded between the second surface of the first transparent substrate and the first surface of the second transparent substrate. The recess region extends from the second surface of the second transparent substrate into the first transparent substrate, so that the first transparent substrate has a step-shaped sidewall. A method of forming an optical chip package is also provided.

Abstract: A chip package includes a semiconductor substrate and a metal layer. The semiconductor substrate has an opening and a sidewall surrounding the opening, in which an upper portion of the sidewall is a concave surface. The semiconductor substrate is made of a material including silicon. The metal layer is located on the semiconductor substrate. The metal layer has plural through holes above the opening to define a MEMS (Microelectromechanical system) structure, in which the metal layer is made of a material including aluminum.

Abstract: A chip package includes a lower substrate, a first silicon nitride substrate, a bonding layer, an upper substrate, a first functional layer, a transparent conductive layer, an isolation layer, and a first conductive pad. The supporting layer is located between the lower substrate and the first silicon nitride substrate, and is made of a material including Benzocyclobutene (BCB). The upper substrate is located on the first silicon nitride substrate. The first functional layer is located between the upper substrate and the first silicon nitride substrate. The transparent conductive layer is located on the upper substrate. The isolation layer covers the upper substrate and the transparent conductive layer. The first conductive pad is located in the isolation layer and in electrical contact with the transparent conductive layer.

Abstract: A chip package is provided. The chip package includes a first substrate and a second substrate disposed over the first substrate. The first substrate and the second substrate have a lower surface and an upper surface, and the second substrate includes a first recess region surrounding the second substrate. The first recess region has a tapered sidewall and a bottom surface that is between the lower and upper surfaces of the second substrate. The chip package also includes at least one conductive pad disposed on the upper surface of the second substrate and a redistribution layer (RDL) correspondingly disposed on the conductive pad. The RDL is extended from the conductive pad onto the bottom surface of the first recess region along the tapered sidewall of the first recess region. A method of forming a chip package is also provided.

Abstract: A chip package includes a lower substrate, a first silicon nitride substrate, a bonding layer, an upper substrate, a first functional layer, a transparent conductive layer, an isolation layer, and a first conductive pad. The supporting layer is located between the lower substrate and the first silicon nitride substrate, and is made of a material including Benzocyclobutene (BCB). The upper substrate is located on the first silicon nitride substrate. The first functional layer is located between the upper substrate and the first silicon nitride substrate. The transparent conductive layer is located on the upper substrate. The isolation layer covers the upper substrate and the transparent conductive layer. The first conductive pad is located in the isolation layer and in electrical contact with the transparent conductive layer.

Abstract: An optical chip package is provided. The optical chip package includes a first transparent substrate, a second transparent substrate, and a spacer layer. The first and second transparent substrates each has a first surface and a second surface opposite the first surface. The first transparent substrate has a thickness that is different than that of the second transparent substrate. The second transparent substrate is disposed over the first transparent substrate, and the spacer layer is bonded between the second surface of the first transparent substrate and the first surface of the second transparent substrate. The recess region extends from the second surface of the second transparent substrate into the first transparent substrate, so that the first transparent substrate has a step-shaped sidewall. A method of forming an optical chip package is also provided.

Abstract: A chip package includes a substrate, a capacitive sensing layer and a computing chip. The substrate has a first surface and a second surface opposite to the first surface, and the capacitive sensing layer is disposed above the second surface and having a third surface opposite to the second surface, which the capacitive sensing layer includes a plurality of capacitive sensing electrodes and a plurality of metal wires. The capacitive sensing electrodes are on the second surface, and the metal wires are on the capacitive sensing electrodes. The computing chip is disposed above the third surface and electrically connected to the capacitive sensing electrodes.

Abstract: A chip package includes a chip, a dam layer, a carrier substrate and a light shielding passivation layer. The chip has a first surface and a second surface opposite to the first surface, and a side surface is disposed between the first surface and the second surface. The dam layer is disposed on the first surface, and the carrier substrate is disposed on the dam layer. The light shielding passivation layer is disposed under the second surface and extended into the carrier substrate to cover the side surface of the chip.

Abstract: A chip package includes a first chip and a second chip. The first chip includes a first substrate having a first surface and a second surface opposite to the first surface, a first passive element on the first surface, and a first protection layer covering the first passive element, which the first protection layer has a third surface opposite to the first surface. First and second conductive pad structures are disposed in the first protection layer and electrically connected to the first passive element. The second chip is disposed on the third surface, which the second chip includes an active element and a second passive element electrically connected to the active element. The active element is electrically connected to the first conductive pad structure.

Abstract: A chip package is provided. The chip package includes a first chip including a carrier substrate and a device substrate thereon. A second chip is mounted on the device substrate. A portion of the device substrate extends outward from the edge of the second chip, so as to be exposed from the second chip. A conductive pad is between the device substrate and the second chip. A polymer protective layer conformally covers the second chip, the exposed portion of the device substrate, and the edge of the carrier substrate. A redistribution layer is disposed on the polymer protective layer and extends into a first opening that passes through the polymer protective layer and the second chip and exposes the conductive pad, so as to be electrically connected to the conductive pad.

Abstract: A chip package includes a chip, an isolation layer, and a redistribution layer. The chip has a substrate, an electrical pad, and a protection layer. The substrate has a first surface and a second surface. The substrate has a through hole, and protection layer has a concave hole, such that the electrical pad is exposed through the concave hole and the through hole. The isolation layer is located on the second surface, the sidewall of the through hole, and the sidewall of the concave hole. The redistribution layer includes a connection portion and a passive element portion. The connection portion is located on isolation layer and in electrical contact with the electrical pad. The passive element portion is located on isolation layer that is on second surface, and an end of passive element portion is connected to connection portion that is on the second surface.

Abstract: A chip package includes a chip, a dam layer, a carrier substrate and a light shielding passivation layer. The chip has a first surface and a second surface opposite to the first surface, and a side surface is disposed between the first surface and the second surface. The dam layer is disposed on the first surface, and the carrier substrate is disposed on the dam layer. The light shielding passivation layer is disposed under the second surface and extended into the carrier substrate to cover the side surface of the chip.

Abstract: A semiconductor electroplating system includes a conducting ring and at least one conductive device. The conducting ring is used for carrying a wafer. The conducting ring has at least two connecting points. The wafer has a first surface and an opposite second surface. An isolation layer is located on the second surface. Two ends of the conductive device are respectively connected to the two connecting points of the conducting ring. When the conducting ring is immersed in the plating solution and is energized, a redistribution layer that is to be patterned is formed on the isolation layer. The conductive device is used for transmitting a partial current that passes through one of the connecting points to the other connecting point.

Abstract: A chip package includes a first chip and a second chip. The first chip includes a first substrate having a first surface and a second surface opposite to the first surface, a first passive element on the first surface, and a first protection layer covering the first passive element, which the first protection layer has a third surface opposite to the first surface. First and second conductive pad structures are disposed in the first protection layer and electrically connected to the first passive element. The second chip is disposed on the third surface, which the second chip includes an active element and a second passive element electrically connected to the active element. The active element is electrically connected to the first conductive pad structure.

Abstract: A chip package includes a chip, an isolation layer, and a redistribution layer. The chip has a substrate, an electrical pad, and a protection layer. The substrate has a first surface and a second surface. The substrate has a through hole, and protection layer has a concave hole, such that the electrical pad is exposed through the concave hole and the through hole. The isolation layer is located on the second surface, the sidewall of the through hole, and the sidewall of the concave hole. The redistribution layer includes a connection portion and a passive element portion. The connection portion is located on isolation layer and in electrical contact with the electrical pad. The passive element portion is located on isolation layer that is on second surface, and an end of passive element portion is connected to connection portion that is on the second surface.

Abstract: A chip package includes a chip, a dielectric bonding layer, a carrier, and a redistribution layer. The chip has a substrate, a conductive pad, and a protection layer. The dielectric bonding layer is located on the protection layer and between the carrier and the protection layer. The carrier, the dielectric bonding layer, and the protection layer have a communicated through hole configured to expose the conductive pad. The redistribution layer includes a connection portion and a passive component portion. The connection portion is located on the conductive pad, the sidewall of the through hole, and a surface of the carrier facing away from the dielectric bonding layer. The passive component portion is located on the surface of the carrier, and an end of the passive component portion is connected to the connection portion that is on the surface of the carrier.

Abstract: A chip package includes a substrate, a capacitive sensing layer and a computing chip. The substrate has a first surface and a second surface opposite to the first surface, and the capacitive sensing layer is disposed above the second surface and having a third surface opposite to the second surface, which the capacitive sensing layer includes a plurality of capacitive sensing electrodes and a plurality of metal wires. The capacitive sensing electrodes are on the second surface, and the metal wires are on the capacitive sensing electrodes. The computing chip is disposed above the third surface and electrically connected to the capacitive sensing electrodes.