Patents by Inventor Hsing Ma

Hsing Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
    Publication number: 20070077499
    Abstract: A method for depositing, by ion beam sputtering, a multilayer reflective coating of a reflective mask blank for EUV lithography on a substrate having a concave defect formed thereon, characterized in that the method comprises carrying out ion beam sputtering so that an absolute value of an angle ? formed between a normal line of a substrate and sputtered particles landing on the substrate is maintained so as to satisfy the formula of 35°???80° while rotating the substrate about a central axis thereof.
    Type: Application
    Filed: October 3, 2005
    Publication date: April 5, 2007
    Applicant: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, David Krick, Hsing Ma