Patents by Inventor Hsiu Feng Yeh

Hsiu Feng Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240382728
    Abstract: The present invention relates to a layered material for mucoadhesion, comprising a modified acrylic polymer and hydroxypropyl methylcellulose, wherein the weight ratio of the modified acrylic polymer: hydroxypropyl methylcellulose is 1:4 to 4:1, and the layered material has a thickness of 0.0001 millimeters to 100 millimeters. The layered material of the present invention has mucoadhesion ability, so it can be prepared into a patch or a needle patch and help the fixation of the patch or the needle patch, and this is advantageous for the controlled-release of drugs. The present invention also relates to a patch comprising the layered material. In addition, the present invention relates to a microneedle patch comprising a needle layer, a base layer and a backing layer, wherein the backing layer comprises the aforementioned layered material and benefits the fixation of the microneedle patch. This microneedle patch is suitable for lesions on mucosa.
    Type: Application
    Filed: September 11, 2023
    Publication date: November 21, 2024
    Inventors: My-Huyen NGUYEN, Hsiu-Feng YEH, Hsiao-Chun CHOU, Jie-Wei HSU, Yi-Jyun LIAO, Hsin-Kuo CHANG, Ta-Jo LIU
  • Publication number: 20240182651
    Abstract: Provided is a hydrogel composition, which comprises a modified HA, PEGDA and water; wherein, based on a total weight of the hydrogel composition, a content of the modified HA is 1 wt % to 7 wt % and a content of PEGDA is 43 wt % to 49 wt %; the modified HA is obtained by modifying HA with methacrylic anhydride; an average molecular weight of PEGDA is 1 kDa to 10 kDa. The hydrogel composition of the present invention has good compatibility of raw materials, which does not cause HA precipitation, and a hydrogel material produced therefrom simultaneously has good mechanical properties, good swell capability and good biocompatibility, such that the hydrogel material can be applied in many fields.
    Type: Application
    Filed: February 14, 2023
    Publication date: June 6, 2024
    Inventors: Ta-Jo LIU, Hsiu-Feng YEH, Shin-Yi YIN, Yi-Jyun LIAO, Ying-Hua HSU
  • Publication number: 20230277431
    Abstract: Provided are an anti-wrinkle composition, an anti-wrinkle microneedle patch and a preparation method thereof. The anti-wrinkle microneedle patch comprises a base and multiple needles, the base has an upper surface, and the needles are formed on the upper surface; wherein, a material of each needle comprises a low-molecular hyaluronic acid, a modified hyaluronic acid and a cross-linked hyaluronic acid. A weight ratio of the modified hyaluronic acid to the low-molecular hyaluronic acid is 0.1 to 4, and a weight ratio of the modified hyaluronic acid to the cross-linked hyaluronic acid is less than 30. Accordingly, the anti-wrinkle microneedle patch has effects of moisturizing the skin, elevating the thickness and the strength of the skin, and smoothing and reducing the wrinkles.
    Type: Application
    Filed: June 21, 2022
    Publication date: September 7, 2023
    Inventors: Ta-Jo LIU, Hsiu-Feng YEH, Ying-Hua HSU
  • Patent number: 11642506
    Abstract: Provided is a microneedle patch comprising a substrate part and multiple needle parts protruding from the substrate part. The substrate part consists of a diffusion-proof layer and a base, and each needle part consists of a needle tip, a diffusion-proof layer and a base. The diffusion-proof layer of each needle part is formed between the needle tip and the base of the corresponding needle part. The diffusion-proof layer of the substrate part and the diffusion-proof layer of needle part are one-piece structures, and so are the base of the substrate part and the base of the needle part. The diffusion-proof layer of the microneedle patch can prevent the active ingredients from diffusing to the base, limit the active ingredients to the needle tip and control the carrying quantity thereof.
    Type: Grant
    Filed: January 11, 2022
    Date of Patent: May 9, 2023
    Assignee: Win Coat Corporation
    Inventors: Ta-Jo Liu, Wan-Hua Li, Han-Yin Cheng, Yi-Jyun Liao, Wen-Hsu Lien, Shin-Yi Yin, Ying-Hua Hsu, Hsiu-Feng Yeh
  • Patent number: 10793701
    Abstract: The present invention relates to a base composition for a microneedle patch and a microneedle patch comprising the same. The base composition comprises a first HPMC, a second HPMC and PVP/VA, wherein the viscosity of the first HPMC is greater than that of the second HPMC, the weight ratio of the first HPMC relative to the second HPMC is 1:0.1 to 1:1.2, and the amount of the PVP/VA is 0.25 wt % to 2 wt %. By controlling the constitution of the base composition, the microneedle patch can not only be demolded smoothly during the stage of the production, but also obtain the desired softness, flatness, flexibility, skin adhesion during the stage of use and humidity resistance during the stage of storage.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: October 6, 2020
    Assignee: WIN COAT CORPORATION
    Inventors: Ta-Jo Liu, Hsiu-Feng Yeh, Yu-Sheng Lin, Yun-Hsuan Chen, Hung-Hsing Lin
  • Publication number: 20060082739
    Abstract: A panel locating method of a projecting system. A first panel is fixed on a first surface of an optical kernel, and an image of the first panel is projected to a lens via the optical kernel. Position of the lens is adjusted to a focus position, and the second and third panels are mounted onto the second and third surfaces of the optical kernel with a pin-to-hole method. Then, positions of the second and third panels are tuned to make images of the second and third panels focusing at the focus position. Finally, positions of the second and third panels are fixed.
    Type: Application
    Filed: October 15, 2004
    Publication date: April 20, 2006
    Inventors: Hsiu Feng Yeh, Ting Hsien Shu
  • Publication number: 20060048590
    Abstract: An adjustable machinery of an optical device includes a first frame for locating the optical device and a second frame for locating the first frame. The first frame has a first alignment hole, a second alignment hole, and a third alignment hole. The second frame has a first adjustment hole, a second adjustment hole, and a third adjustment hole. The first and second frames can relatively shift along a first direction. When locating the first frame on the second frame, the alignment holes and the adjustment holes are partially overlapped, and the relative positions of the first and second frames can be adjusted by changing the relative positions of the alignment holes and the adjustment holes.
    Type: Application
    Filed: August 18, 2004
    Publication date: March 9, 2006
    Inventors: Fan Chieh Chang, Hsiu Feng Yeh