Patents by Inventor Hsiu-Hsien Wu

Hsiu-Hsien Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240090215
    Abstract: The method of forming the semiconductor structure includes the following steps. First trenches and second trenches are respectively formed in a substrate of the logic region and the substrate of the array region. A dielectric liner is formed in the first trenches and second trenches. First coating blocks and second coating blocks are respectively formed in the first trenches and second trenches. A cap layer is formed on the first coating blocks and the second coating blocks. Oxide structures are formed on the cap layer. Part of the oxide structures and part of the cap layer is removed. A semiconductor layer is formed in the array region and disposed on the substrate and between the oxide structures.
    Type: Application
    Filed: September 9, 2022
    Publication date: March 14, 2024
    Inventors: Yuan-Huang WEI, Chien-Hsien WU, Hsiu-Han LIAO
  • Patent number: 8268272
    Abstract: A method for removing vinyl monomers from a gas stream comprises steps of: irradiating a photoactive-inorganic medium by a light emitting unit to activate the photoactive-inorganic medium; and pumping a gas stream including vinyl monomers to contact with the activated photoactive-inorganic medium to make the vinyl monomers in the gas stream to polymerize on the photoactive-inorganic medium to jointly form a polymeric nano-composite.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: September 18, 2012
    Assignee: National Pingtung University Of Science & Technology
    Inventors: Wu-Jang Huang, Ling-Yin Chang, Yen-Chia Liu, Hsiu-Hsien Wu, Yi-Ching Li
  • Publication number: 20120035295
    Abstract: A method for removing vinyl monomers from a gas stream comprises steps of: irradiating a photoactive-inorganic medium by a light emitting unit to activate the photoactive-inorganic medium; and pumping a gas stream including vinyl monomers to contact with the activated photoactive-inorganic medium to make the vinyl monomers in the gas stream to polymerize on the photoactive-inorganic medium to jointly form a polymeric nano-composite.
    Type: Application
    Filed: October 18, 2011
    Publication date: February 9, 2012
    Inventors: Wu-jang HUANG, Ling-Yin Chang, Yen-Chia Liu, Hsiu-Hsien Wu, Yi-Ching Li
  • Publication number: 20100111798
    Abstract: An apparatus for removing vinyl monomers from a gas stream includes a tube, a shading casing and a light emitting unit. The tube includes a first section having a connecting port with an opening, a second section, and a third section having an outlet. The three sections sequentially link together, with the second section connecting between the first section and the third section. A photoactive-inorganic medium is arranged inside the second section. The shading casing surrounds and seals the second section and an inner surface of the shading casing defines a reflecting face. The light emitting unit is mounted to the shading casing to irradiate and activate the photoactive-inorganic medium in the second section. Accordingly, the photoactive-inorganic medium can be activated by the light emitting unit to photocatalyze vinyl monomers in a gas stream to polymerize on surfaces of the photoactive-inorganic medium, such that vinyl monomers are removed.
    Type: Application
    Filed: March 11, 2009
    Publication date: May 6, 2010
    Inventors: Wu-Jang HUANG, Ling-Yin CHANG, Yen-Chia LIU, Hsiu-Hsien WU, Yi-Ching Li