Patents by Inventor HSIU MEI HSU

HSIU MEI HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11957262
    Abstract: A device for installing curtain gliders is revealed. The device for installing curtain gliders is a positioning strip. A plurality of gliders are arranged at the positioning strip and then carried and mounted into a curtain track by the positioning strip. The positioning strip is provided with a plurality of mounting and positioning units each of which includes a main hole, two slots disposed on two ends of the main hole, and two locking pieces located between the two slots and the main hole. Thereby the glider with different designs can be inserted into the main hole and the locking pieces are abutting against the glider for positioning the glider. Installers can assemble the gliders quickly and conveniently by count marks on the positioning strip.
    Type: Grant
    Filed: February 19, 2021
    Date of Patent: April 16, 2024
    Assignee: Carrot Industrial Co., Ltd.
    Inventors: Hsiu-Mei Hsu, Hou-Cheng Ko
  • Publication number: 20220265078
    Abstract: A device for installing curtain gliders is revealed. The device for installing curtain gliders is a positioning strip. A plurality of gliders are arranged at the positioning strip and then carried and mounted into a curtain track by the positioning strip. The positioning strip is provided with a plurality of mounting and positioning units each of which includes a main hole, two slots disposed on two ends of the main hole, and two locking pieces located between the two slots and the main hole. Thereby the glider with different designs can be inserted into the main hole and the locking pieces are abutting against the glider for positioning the glider. Installers can assemble the gliders quickly and conveniently by count marks on the positioning strip.
    Type: Application
    Filed: February 19, 2021
    Publication date: August 25, 2022
    Inventors: HSIU-MEI HSU, HOU-CHENG KO
  • Patent number: 9099861
    Abstract: An over-voltage protection device includes a substrate, an insulation layer having a depression over the substrate, a conductor layer having a first electrode and a second electrode over the insulation layer, wherein the first electrode and the second electrode form a discharge path, and the depression is under the discharge path. A method for preparing the over-voltage protection device includes the steps of forming an insulation layer over a substrate; forming a depression in the insulation layer; forming a photoresist pattern filling the depression and protruding the insulation layer; forming a conductor layer over the insulation layer; and removing the photoresist pattern, wherein the photoresist pattern divides the conductor layer into a first electrode and a second electrode that form a discharge path, and the depression is under the discharge path after the removal of the photoresist pattern.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: August 4, 2015
    Assignee: INPAQ TECHNOLOGY CO., LTD.
    Inventors: Hsiu Lun Yeh, Yu Chia Chang, Tze Chun Liu, Hsiu Mei Hsu
  • Publication number: 20140347772
    Abstract: An over-voltage protection device includes a substrate, an insulation layer having a depression over the substrate, a conductor layer having a first electrode and a second electrode over the insulation layer, wherein the first electrode and the second electrode form a discharge path, and the depression is under the discharge path. A method for preparing the over-voltage protection device includes the steps of forming an insulation layer over a substrate; forming a depression in the insulation layer; forming a photoresist pattern filling the depression and protruding the insulation layer; forming a conductor layer over the insulation layer; and removing the photoresist pattern, wherein the photoresist pattern divides the conductor layer into a first electrode and a second electrode that form a discharge path, and the depression is under the discharge path after the removal of the photoresist pattern.
    Type: Application
    Filed: May 23, 2013
    Publication date: November 27, 2014
    Applicant: INPAQ TECHNOLOGY CO., LTD.
    Inventors: HSIU LUN YEH, YU CHIA CHANG, TZE CHUN LIU, HSIU MEI HSU
  • Publication number: 20130244343
    Abstract: One aspect of the present invention provides a method for preparing a thin film device with an insulation layer from a dry polyimide film and a method for preparing a common mode filter using the same. A method for preparing a thin film device according to this aspect of the present invention includes the steps of forming at least one first conductive pattern on a substrate; placing a dry polyimide film on the first conductive pattern; applying a force to the dry polyimide film such that the dry polyimide film fills spaces in the first conductive pattern; and forming at least one second conductive pattern on the dry polyimide film.
    Type: Application
    Filed: March 19, 2012
    Publication date: September 19, 2013
    Applicant: INPAQ TECHNOLOGY CO., LTD.
    Inventors: HUAI LUH CHANG, YU CHIA CHANG, MING FUNG HSIEH, HSIU MEI HSU, KUO JUNG FU