Patents by Inventor Hsu-Fu Hung

Hsu-Fu Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070193876
    Abstract: A manufacturing method for sputtering an anti-refection layer onto a board at low temperature has the merits of easily being implemented and easily mass-produced. The manufacturing method is used for sputtering multiple anti-refection layers onto a board. The method can be used for mass-producing anti-reflection panels as the raw material for the photo industry. The method is superior to the manufacturing method for producing nebulization anti-reflection panels. This invention utilizes the anti-reflection characteristics of the board structure that is sputtered and stacked alternatively with high index refraction layers and low index refraction layers. A continuous manufacturing process is adopted. The present invention uses plasma to clean the surface of the boards and adopts a traditional sputtering machine. Therefore, it is convenient for installing and mass-producing high quality material.
    Type: Application
    Filed: February 22, 2006
    Publication date: August 23, 2007
    Inventors: Jau-Jier Chu, Hsu-Fu Hung, I-Wen Lee, Chien-Min Weng, Chao-Lan Lee
  • Publication number: 20070119702
    Abstract: A method for sputtering a multilayer film on a sheet workpiece at a low temperature of the present invention has the following steps: employing plasma to clean a surface of a sheet workpiece, sputtering at least one metal oxide or semiconductor oxide on the sheet workpiece, and sputtering at least one ITO transparent electric layer on the sheet workpiece. The film sputtering process of the sheet workpiece employs continuously connecting work stations, thereby controlling delay time between the work stations of the sheet workpiece within a given range. The sheet workpiece is made from a macromolecular material.
    Type: Application
    Filed: November 30, 2005
    Publication date: May 31, 2007
    Inventors: Jau-Jier Chu, Hsu-Fu Hung, I-Wen Lee, Chien-Min Weng, Tzu-Wen Chu
  • Publication number: 20070119704
    Abstract: A method for sputtering a multilayer film on a sheet workpiece at a low temperature of the present invention has the following steps: employing plasma to modify a surface of a sheet workpiece, providing a reciprocating sputtering process to deposit metal oxide layers or semiconductor oxide layers on the sheet workpiece, preheating the sheet workpiece and providing a reciprocating ITO sputtering process to sputter ITO transparent conductive layers on the sheet workpiece. The film sputtering process of the sheet workpiece employs continuously connecting work line and controls delay time between the sputtering units to deposit a film with a predetermined thickness on the sheet workpiece.
    Type: Application
    Filed: January 29, 2007
    Publication date: May 31, 2007
    Inventors: Jau-Jier Chu, Hsu-Fu Hung, I-Wen Lee, Chien-Min Weng, Tzu-Wen Chu