Patents by Inventor Hsu-Hung Huang

Hsu-Hung Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240096998
    Abstract: The present disclosure describes a method for forming metallization layers that include a ruthenium metal liner and a cobalt metal fill. The method includes depositing a first dielectric on a substrate having a gate structure and source/drain (S/D) structures, forming an opening in the first dielectric to expose the S/D structures, and depositing a ruthenium metal on bottom and sidewall surfaces of the opening. The method further includes depositing a cobalt metal on the ruthenium metal to fill the opening, reflowing the cobalt metal, and planarizing the cobalt and ruthenium metals to form S/D conductive structures with a top surface coplanar with a top surface of the first dielectric.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shuen-Shin LIANG, Chij-chien CHI, Yi-Ying LIU, Chia-Hung CHU, Hsu-Kai CHANG, Cheng-Wei CHANG, Chein-Shun LIAO, Keng-chu LIN, KAi-Ting HUANG
  • Patent number: 10156513
    Abstract: A sample cell can be designed to minimize excess gas volume. Described features can be advantageous in reducing an amount of gas required to flow through the sample cell during spectroscopic measurements, and in reducing a time (e.g. a total volume of gas) required to flush the cell between sampling events. In some examples, contours of the inners surfaces of the sample cell that contact the contained gas can be shaped, dimensioned, etc. such that a maximum clearance distance is provided between the inner surfaces at one or more locations. Systems, methods, and articles, etc. are described.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: December 18, 2018
    Assignee: SpectraSensors, Inc.
    Inventors: Peter Scott, Alfred Feitisch, Peter Dorn, Adam S. Chaimowitz, Hsu-Hung Huang, Mathias Schrempel, Lutz Keller
  • Patent number: 10072980
    Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.
    Type: Grant
    Filed: December 12, 2016
    Date of Patent: September 11, 2018
    Assignee: SpectraSensors, Inc.
    Inventors: Alfred Feitisch, Xiang Liu, Chih-Husan Chang, Hsu-Hung Huang
  • Publication number: 20170248466
    Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.
    Type: Application
    Filed: December 12, 2016
    Publication date: August 31, 2017
    Inventors: ALFRED FEITISCH, Xiang Liu, Chih-Husan Chang, Hsu-Hung Huang
  • Patent number: 9618391
    Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: April 11, 2017
    Assignee: SpectraSensors, Inc.
    Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard L. Cline
  • Patent number: 9518866
    Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: December 13, 2016
    Assignee: SpectraSensors, Inc.
    Inventors: Alfred Feitisch, Xiang Liu, Chih-Husan Chang, Hsu-Hung Huang
  • Publication number: 20160153890
    Abstract: A sample cell can be designed to minimize excess gas volume. Described features can be advantageous in reducing an amount of gas required to flow through the sample cell during spectroscopic measurements, and in reducing a time (e.g. a total volume of gas) required to flush the cell between sampling events. In some examples, contours of the inners surfaces of the sample cell that contact the contained gas can be shaped, dimensioned, etc. such that a maximum clearance distance is provided between the inner surfaces at one or more locations. Systems, methods, and articles, etc. are described.
    Type: Application
    Filed: July 23, 2015
    Publication date: June 2, 2016
    Inventors: Peter Scott, Alfred Feitisch, Peter Dorn, Adam S. Chaimowitz, Hsu-Hung Huang, Mathias Schrempel, Lutz Keller
  • Publication number: 20160054178
    Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.
    Type: Application
    Filed: August 22, 2014
    Publication date: February 25, 2016
    Inventors: Alfred Feitisch, Xiang Liu, Chih-Husan Chang, Hsu-Hung Huang
  • Publication number: 20160011047
    Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.
    Type: Application
    Filed: February 27, 2015
    Publication date: January 14, 2016
    Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard L. Cline
  • Patent number: 9109951
    Abstract: A sample cell can be designed to minimize excess gas volume. Described features can be advantageous in reducing an amount of gas required to flow through the sample cell during spectroscopic measurements, and in reducing a time (e.g. a total volume of gas) required to flush the cell between sampling events. In some examples, contours of the inners surfaces of the sample cell that contact the contained gas can be shaped, dimensioned, etc. such that a maximum clearance distance is provided between the inner surfaces at one or more locations. Systems, methods, and articles, etc. are described.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: August 18, 2015
    Assignee: SpectraSensors, Inc.
    Inventors: Peter Scott, Alfred Feitisch, Peter Dorn, Adam S. Chaimowitz, Hsu-Hung Huang, Mathias Schrempel, Lutz Keller
  • Publication number: 20150124257
    Abstract: A sample cell can be designed to minimize excess gas volume. Described features can be advantageous in reducing an amount of gas required to flow through the sample cell during spectroscopic measurements, and in reducing a time (e.g. a total volume of gas) required to flush the cell between sampling events. In some examples, contours of the inners surfaces of the sample cell that contact the contained gas can be shaped, dimensioned, etc. such that a maximum clearance distance is provided between the inner surfaces at one or more locations. Systems, methods, and articles, etc. are described.
    Type: Application
    Filed: November 6, 2013
    Publication date: May 7, 2015
    Applicant: SpectraSensors, Inc.
    Inventors: Peter Scott, Alfred Feitisch, Peter Dorn, Adam S. Chaimowitz, Hsu-Hung Huang, Mathias Schrempel, Lutz Keller
  • Patent number: 8976358
    Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: March 10, 2015
    Assignee: SpectraSensors, Inc.
    Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard Cline
  • Publication number: 20130250301
    Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.
    Type: Application
    Filed: March 23, 2012
    Publication date: September 26, 2013
    Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard Cline
  • Publication number: 20060176910
    Abstract: This invention is related to a method and a system for producing and transmitting the multi-media. Some main characteristics are the step of integrating both the image and the sound, which corresponds to numerous received signals, into a multi-media file (the step of simultaneously producing) and the step of sending both the image and the sounds by transmitting the multi-media file (the step of simultaneously transmitting).
    Type: Application
    Filed: February 8, 2005
    Publication date: August 10, 2006
    Inventors: Hsu-Hung Huang, Chen-Yu Yeh