Patents by Inventor Hsu Min-Ching

Hsu Min-Ching has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for decreasing contact resistance of source/drain electrodes
    Publication number: 20040198046
    Abstract: Ammonia gas plasma is introduced to surface of source and drain electrodes before formation of passivation layer on the source and drain electrodes to passivate the surface of the source and drain electrodes, to remove residues, particles, and oxide generated by antecedent etching step, and to saturate dangling bonds on surface of a channel region.
    Type: Application
    Filed: April 1, 2003
    Publication date: October 7, 2004
    Inventors: Lee Yu-Chou, Hsu Min-Ching