Patents by Inventor Hsu-Tang LIU

Hsu-Tang LIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask weak pattern recognition apparatus and mask weak pattern recognition method
    Patent number: 10762618
    Abstract: A mask weak pattern recognition apparatus and a mask weak pattern recognition method are provided. The mask weak pattern recognition apparatus includes a receiving unit, an overlapping unit, an analyzing unit and a training unit. The receiving unit is used for receiving a mask layout and an inspection image of a mask. The overlapping unit is used for overlapping the mask layout and the inspection image to obtain an overlapped image. The analyzing unit is used for obtaining a plurality of risk patterns and a plurality of risk scores each of which corresponds one of the risk patterns according to the overlapped image. The training unit is used for training a recognition model according to the risk patterns and the risk scores.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: September 1, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Pin-Yen Tsai, Hsu-Tang Liu, Yi-Jung Chang, Chun-Liang Hou
  • MASK WEAK PATTERN RECOGNITION APPARATUS AND MASK WEAK PATTERN RECOGNITION METHOD
    Publication number: 20200265573
    Abstract: A mask weak pattern recognition apparatus and a mask weak pattern recognition method are provided. The mask weak pattern recognition apparatus includes a receiving unit, an overlapping unit, an analyzing unit and a training unit. The receiving unit is used for receiving a mask layout and an inspection image of a mask. The overlapping unit is used for overlapping the mask layout and the inspection image to obtain an overlapped image. The analyzing unit is used for obtaining a plurality of risk patterns and a plurality of risk scores each of which corresponds one of the risk patterns according to the overlapped image. The training unit is used for training a recognition model according to the risk patterns and the risk scores.
    Type: Application
    Filed: February 14, 2019
    Publication date: August 20, 2020
    Inventors: Pin-Yen TSAI, Hsu-Tang LIU, Yi-Jung CHANG, Chun-Liang HOU