Patents by Inventor Hsueh-Feng Shih

Hsueh-Feng Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090024588
    Abstract: Methods and systems for searching for information. First, a classification code corresponding to a specific classification is received. At least a first keyword is selected from a plurality of keywords in a keyword bank corresponding to the classification code. Information is searched for according to the first keyword.
    Type: Application
    Filed: November 8, 2007
    Publication date: January 22, 2009
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventor: Hsueh-Feng Shih
  • Patent number: 7438578
    Abstract: A connector socket includes a housing with a slot for receiving a connecting portion of memory module; a side plate disposed inside the slot and mounted on an inner sidewall of the slot; at least two rows of sleeves alternately arranged and mounted on the side plate; a plurality of first conductive arms having first conductive distal terminals, passing through corresponding upper row of the at least two rows of sleeves; a plurality of second conductive arms having second conductive distal terminals, passing through corresponding lower row of the at least two rows of sleeves; and a pushing member on the housing for pushing the resilient side plate such that the first conductive distal terminals can contact with an upper row of fingers on the connecting portion, while the second conductive distal terminals can contact with a lower row of fingers on the connecting portion.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: October 21, 2008
    Assignee: Nanya Technology Corp.
    Inventors: Shu-Liang Nin, Hsueh-Feng Shih
  • Patent number: 6664149
    Abstract: The present invention discloses a structure of a TFT-LCD and its forming process in order to reduce the number of masking steps for manufacturing the tri-layer structure of a TFT-LCD, and further provides a process for forming a TFT-LCD with four masking steps. In addition, the forming processes of a storage capacitor, a wiring pad and an electrostatic discharge structure are performed simultaneously with the forming process of a TFT-LCD.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: December 16, 2003
    Assignee: Hannstar Display Corp.
    Inventor: Hsueh-Feng Shih
  • Publication number: 20030134458
    Abstract: The present invention discloses a structure of a TFT-LCD and its forming process in order to reduce the number of masking steps for manufacturing the tri-layer structure of a TFT-LCD, and further provides a process for forming a TFT-LCD with four masking steps. In addition, the forming processes of a storage capacitor, a wiring pad and an electrostatic discharge structure are performed simultaneously with the forming process of a TFT-LCD.
    Type: Application
    Filed: October 15, 2002
    Publication date: July 17, 2003
    Applicant: Hannstar Display Corp.
    Inventor: Hsueh-Feng Shih
  • Patent number: 6509614
    Abstract: The present invention discloses a structure of a TFT-LCD and its forming process in order to reduce the number of masking steps for manufacturing the tri-layer structure of a TFT-LCD, and further provides a process for forming a TFT-LCD with four masking steps. In addition, the forming processes of a storage capacitor, a wiring pad and an electrostatic discharge structure are performed simultaneously with the forming process of a TFT-LCD.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: January 21, 2003
    Assignee: Hannstar Display Corp.
    Inventor: Hsueh-Feng Shih
  • Patent number: 5976902
    Abstract: An ITO layer and a first metal layer is patterned on a glass substrate. A first silicon nitride layer, a silicon layer and a second silicon nitride layer are formed on the substrate. A back-side exposure is introduced using the gate electrodes as a mask. The second silicon nitride layer that is not covered by a positive photoresist is etched. A heavily doped silicon layer is formed over the substrate. A negative photoresist is formed over the heavily doped silicon layer. Then, a further back-side exposure is employed. The heavily doped silicon layer over the etched second silicon nitride layer is removed. Via holes are created to expose a portion of the first metal layer. A second metal layer and a third metal layer are respectively formed. Next, a thermal annealing is performed for forming silicide. Subsequently, a third metal layer and the second metal layer are patterned. Then, the island pattern is defined.
    Type: Grant
    Filed: August 3, 1998
    Date of Patent: November 2, 1999
    Assignee: Industrial Technology Research Institute
    Inventor: Hsueh-Feng Shih