Patents by Inventor Hsueh-Hung Wu

Hsueh-Hung Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250081904
    Abstract: The present invention generally relates to a hydroponic culture medium and a hydroponic planting system, more particularly to a Houttuynia cordata hydroponic culture medium, a Houttuynia cordata hydroponic planting system, Houttuynia cordata extracts, a method, and applications thereof. The Houttuynia cordata hydroponic culture medium includes a plant fertilizer and a Houttuynia cordata growth-promoting additive. The Houttuynia cordata growth-promoting additive is selected from the group consisting of: vitamin B complex, seaweed essence, amino acid, microorganism, and a combination thereof. An electronic conductivity of the Houttuynia cordata hydroponic culture medium is between 0.4 ms/cm and 2.0 ms/cm.
    Type: Application
    Filed: November 22, 2024
    Publication date: March 13, 2025
    Inventors: FANG-RONG CHANG, WEI-HUNG WU, YI-HONG TSAI, CHUNG-HSIEN CHEN, YEN-CHI LOO, HSUEH-ER CHEN, YEN-CHANG CHEN, HUI-PING HSIEH, CHEN HSIEH
  • Patent number: 9360778
    Abstract: Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an integrated circuit substrate; an alignment module coupled with the lithography exposure tool, designed for alignment measurement, and configured for transferring the integrated circuit substrate to the lithography exposure tool; and an alignment calibration module designed to calibrate the alignment module relative to the lithography exposure.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: June 7, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Jui Chen, Fu-Jye Liang, Hsueh-Hung Wu
  • Publication number: 20130229638
    Abstract: Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an integrated circuit substrate; an alignment module coupled with the lithography exposure tool, designed for alignment measurement, and configured for transferring the integrated circuit substrate to the lithography exposure tool; and an alignment calibration module designed to calibrate the alignment module relative to the lithography exposure.
    Type: Application
    Filed: March 2, 2012
    Publication date: September 5, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Li-Jui Chen, Fu-Jye Liang, Hsueh-Hung Wu