Patents by Inventor Hsueh-Hung Wu

Hsueh-Hung Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for lithography patterning
    Patent number: 9360778
    Abstract: Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an integrated circuit substrate; an alignment module coupled with the lithography exposure tool, designed for alignment measurement, and configured for transferring the integrated circuit substrate to the lithography exposure tool; and an alignment calibration module designed to calibrate the alignment module relative to the lithography exposure.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: June 7, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Jui Chen, Fu-Jye Liang, Hsueh-Hung Wu
  • SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING
    Publication number: 20130229638
    Abstract: Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an integrated circuit substrate; an alignment module coupled with the lithography exposure tool, designed for alignment measurement, and configured for transferring the integrated circuit substrate to the lithography exposure tool; and an alignment calibration module designed to calibrate the alignment module relative to the lithography exposure.
    Type: Application
    Filed: March 2, 2012
    Publication date: September 5, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Li-Jui Chen, Fu-Jye Liang, Hsueh-Hung Wu