Abstract: A semiconductor device includes a substrate, a stack of semiconductor nanosheets, a dielectric wall, and a gate structure. The substrate includes a nanosheet mesa, and the stack of semiconductor nanosheets is disposed on the nanosheet mesa. The dielectric wall crosses through the nanosheet mesa and the stack of semiconductor nanosheets. The gate structure wraps the stack of semiconductor nanosheets and crosses over the dielectric wall, wherein a top of the dielectric wall has a recess.

Abstract: A method for managing a digital identity system includes generating a user digital identity for a user, generating an asset digital identity for an asset, generating a user public key and a user private key after the user digital identity is generated, generating descriptive data related to the asset, generating a data public key and a data private key after the descriptive data is generated, encrypting the data with the data public key to generate encrypted data, saving the data private key on a user end, uploading the encrypted data to a cloud database, a platform reading the encrypted data from the cloud database, a data requester querying and requesting for data, forwarding a data request to a data owner in an qualified data owner set and granting a data access to the data request if the data owner accepts the data request.

Abstract: A method includes receiving a higher-layer signal from a base station, wherein the higher-layer signal enables the use of 2-stage DCI based cross-carrier scheduling and provides mapping between a scheduling serving cell and one or more scheduled serving cells; receiving a first-stage DCI carried in a PDCCH in a designated time interval in the scheduling serving cell, wherein the first-stage DCI provides the information related to the corresponding second-stage DCI; receiving a second-stage DCI corresponding to the first-stage DCI in a specific set of resource elements in the same designated time interval in the same scheduling cell as the first-stage DCI-based on the information provided in the first-stage DCI, wherein the second-stage DCI provides scheduling information for the scheduled serving cells; and performing data reception or transmission over the scheduled serving cells based on the received 2-stage DCI.

Abstract: A method of determining matching performance between tools used in semiconductor manufacture and associated tools is described. The method includes obtaining a plurality of data sets related to a plurality of tools and a representation of the data sets in a reduced space having a reduced dimensionality. A matching metric and/or matching correction is determined based on matching the reduced data sets in the reduced space.

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

Abstract: A method includes receiving a higher-layer signal from a base station, wherein the higher-layer signal enables the use of 2-stage DCI based cross-carrier scheduling and provides mapping between a scheduling serving cell and one or more scheduled serving cells; receiving a first-stage DCI carried in a PDCCH in a slot in the scheduling serving cell, wherein the first-stage DCI provides the information related to the corresponding second-stage DCI; receiving a second-stage DCI corresponding to the first-stage DCI in a specific set of resource elements in the same slot in the same scheduling cell as the first-stage DCI-based on the information provided in the first-stage DCI, wherein the second-stage DCI provides scheduling information for the scheduled serving cells; and performing data reception or transmission over the scheduled serving cells based on the received 2-stage DCI.

Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.

Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

Abstract: Various solutions for cross-carrier hybrid automatic repeat request (HARQ) transmissions in wireless communications are described. An apparatus performs a HARQ initial transmission on a first component carrier (CC). The apparatus then performs a HARQ retransmission on a second CC different from the first CC.

Abstract: A method includes receiving a first higher-layer signal from a base station, wherein the first higher-layer signal enables the use of single PDCCH scheduling PDSCH(s) in two or more serving cells; receiving a second higher-layer signal from the base station, wherein the second higher-layer signal enables the use of cross-carrier HARQ management within the serving cells; receiving DCI in one of the serving cells to obtain the scheduling information of PDSCH(s) in the serving cells; receiving the scheduled PDSCH(s) in the serving cells based on the received DCI to obtain downlink transport blocks carried in the scheduled PDSCH(s); and sending downlink transport blocks to a HARQ entity of the serving cell indicated in the DCI carried in a PDCCH for HARQ management based on a HARQ process number indicated in the DCI carried in the PDCCH.

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

Abstract: A method of UE power profile adaptation to traffic and UE power consumption characteristics based on power profile is proposed. In one preferred embodiment, hybrid of bandwidth part (BWP) and power profile is proposed. UE is configured with multiple BWPs and each BWP includes a set of power profiles. Two types of adaptation triggering can be used, a first type of trigger is based on power saving signals sent from the network, and the second type of trigger is based on timers. When the traffic characteristic for UE changes, the network can send a power saving signal to UE to trigger power profile adaptation, e.g., BWP+power profile switching. When traffic has been digested and becomes sporadic, then power profile adaptation can be triggered based on timers, e.g., a timer for BWP adaptation and another timer for power profile adaptation.

Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.

Abstract: Various solutions with respect to cross-slot scheduling for power saving in mobile communications are described. An apparatus receives, from a wireless network, a control signaling. According to the control signaling, the apparatus changes an aspect of a power profile of at least one bandwidth part (BWP) of a plurality of BWPs without causing data interruption regarding data transmission or reception by the apparatus. The apparatus also receives, from the wireless network, an indication. According to the indication, the apparatus adapts a new minimum applicable value of at least one of a downlink scheduling offset (K0), an uplink scheduling offset (K2), and an aperiodic channel state information reference signal (CSI-RS) triggering offset for an active DL BWP or an active UL BWP of the plurality of BWPs.

Abstract: A method of UE power profile adaptation to traffic and UE power consumption characteristics based on power profile is proposed. In one preferred embodiment, hybrid of bandwidth part (BWP) and power profile is proposed. UE is configured with multiple BWPs and each BWP includes a set of power profiles. Two types of adaptation triggering can be used, a first type of trigger is based on power saving signals sent from the network, and the second type of trigger is based on timers. When the traffic characteristic for UE changes, the network can send a power saving signal to UE to trigger power profile adaptation, e.g., BWP+power profile switching. When traffic has been digested and becomes sporadic, then power profile adaptation can be triggered based on timers, e.g., a timer for BWP adaptation and another timer for power profile adaptation.

Abstract: In an aspect of the disclosure, a method, a computer-readable medium, and an apparatus are provided. The apparatus may be a UE. The UE attempts to detect a trigger event. The UE determines values of a first set of power configuration parameters when the trigger event is detected. The UE transmits or receives signals in accordance with the values of the first set of power configuration parameters.

Abstract: A method of providing UE-initiated PDCP status report to reduce packet latency under Multi-RAT Dual Connectivity (MR-DC) is proposed. UE initializes PDCP status report based on some predefined condition configured by the network. The PDCP status report indicates which PDCP SDU is still not received by the UE via one radio link control (RLC) entity, and the network can retransmit the missing PDCP SDU via another RLC entity quickly. The network can enable/disable the PDCP status report via PDCP control PDU or via radio resource control (RRC) signaling. The PDCP status can be used for re-transmission of PDCP SDU on another RLC entity. The PDCP status can also be used as an indication of issues on one RLC entity, resulting in duplication being activated thereafter. The PDCP status report should be sent to the RLC entity that does not suffer from the PDCP packet loss.

Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.

Abstract: A method includes receiving a first higher-layer signal from a base station, wherein the first higher-layer signal enables the use of single PDCCH scheduling PDSCH(s) in two or more serving cells; receiving a second higher-layer signal from the base station, wherein the second higher-layer signal enables the use of cross-carrier HARQ management within the serving cells; receiving DCI in one of the serving cells to obtain the scheduling information of PDSCH(s) in the serving cells; receiving the scheduled PDSCH(s) in the serving cells based on the received DCI to obtain downlink transport blocks carried in the scheduled PDSCH(s); and sending downlink transport blocks to a HARQ entity of the serving cell indicated in the DCI carried in a PDCCH for HARQ management based on a HARQ process number indicated in the DCI carried in the PDCCH.