Patents by Inventor Hu Zheng

Hu Zheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240126112
    Abstract: A display device, including a backlight module (1). The backlight module (1) includes an optical film layer (2), the optical film layer (2) includes at least two diffusers (21) stacked in sequence, and the haze of each diffuser (21) is 80%-99%. The backlight module (1) further includes an LED light source (3), and the optical band of the LED light source (3) is greater than 455 nm. The display device further includes a cover plate (5) and at least one anti-reflection layer (7), the cover plate (5) is provided with an atomization layer (51), and the anti-reflection layer (7) is located on the side of the cover plate (5) facing away from a display panel (4).
    Type: Application
    Filed: February 23, 2021
    Publication date: April 18, 2024
    Inventors: Hu LI, Tingfei WANG, Liangliang ZHENG, Hai KANG, Douqing ZHANG, Zhao DONG, Xuemei ZHAO
  • Publication number: 20240116148
    Abstract: A tool set includes a tool holder, a tool and a tool rack. The tool has a groove unit. The tool holder has a latch unit that engages the groove unit. The tool rack includes a rack body and a blocking member. When the tool holder is moved away from the rack body after the tool is moved into the rack body by the tool holder and after the blocking member moves to a blocking position, the tool is blocked by the blocking member so that the latch unit is separated from the groove unit and that the tool holder is separated from the tool.
    Type: Application
    Filed: August 28, 2023
    Publication date: April 11, 2024
    Applicant: Jabil Inc.
    Inventors: Harpuneet Singh, Lei Hu, Ying-Chieh Huang, Wei-Hsiu Hsieh, Xiao-Ting Zheng, Chien-Cheng Chu, Tike Hoong Phua, Li Yun Chee
  • Publication number: 20240116724
    Abstract: A container feeding device includes a casing and first and second latch members. The casing defines a lower retaining space for receiving a plurality of containers that are stacked on one another. The first latch member is operable to enter the lower retaining space for supporting a bottommost container, or leave the lower retaining space to release the bottommost container. The second latch member enters the lower retaining space to support a second bottommost container when the bottommost container is released by the first latch member.
    Type: Application
    Filed: July 27, 2023
    Publication date: April 11, 2024
    Applicant: Jabil Inc.
    Inventors: Harpuneet Singh, Lei Hu, Ying-Chieh Huang, Wei-Hsiu Hsieh, Xiao-Ting Zheng, Chien-Cheng Chu, Arya Anil
  • Patent number: 11949128
    Abstract: This application provides a current collecting member, a secondary battery, and a fabrication method. The secondary battery includes an electrode assembly, a housing, a top cover assembly and current collecting members. The electrode assembly includes a main body portion and a first tab extending from an end of the main body portion along a transverse direction. The top cover assembly includes a top cover plate and a first electrode terminal disposed on the top cover plate connected to the housing. The current collecting member is connected to the first tab and the first electrode terminal. The current collecting member includes a substrate and a support plate, the substrate being provided at a side of the main body portion along a transverse direction, the support plate extending from an end part of the substrate in a longitudinal direction, and the first tab being connected to the support plate.
    Type: Grant
    Filed: May 11, 2021
    Date of Patent: April 2, 2024
    Assignee: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
    Inventors: Hu Xu, Miaomiao Ren, Yuanbao Chen, Long Xu, Donglai Zheng, Lingbo Zhu, Yongshou Lin
  • Publication number: 20240091893
    Abstract: A mounting frame for being mounted with either one of first and second screwdrivers, includes a main frame, a mounting seat, and first and second mounting plates. The mounting seat has a plate attachment hole set. The first mounting plate has a first seat attachment hole set operable to be connected to the plate attachment hole set, and a first driver attachment hole set for the first screwdriver to be attached thereto. The second mounting plate has a second seat attachment hole set operable to be connected to the plate attachment hole set, and a second driver attachment hole set for the second screwdriver to be attached thereto.
    Type: Application
    Filed: August 16, 2023
    Publication date: March 21, 2024
    Applicant: Jabil Inc.
    Inventors: Harpuneet Singh, Lei Hu, Ying-Chieh Huang, Wei-Hsiu Hsieh, Xiao-Ting Zheng, Chien-Cheng Chu
  • Patent number: 11924358
    Abstract: This application provides a method for issuing a digital certificate performed by a digital certificate issuing center that includes a public-private key generation module and an authentication module. The method includes: receiving a public-private key request from a node in a blockchain network; generating a public key and a private key of the node by using the public-private key generation module, and transmitting the public and private keys to the node; receiving the public key of the node and registration information of the node, and authenticating the registration information by using the authentication module; and generating, in accordance with a determination that the authentication succeeds, a digital certificate of the node by using the authentication module, and transmitting the digital certificate to the node. The embodiments of this application can improve the probative value of an issued digital certificate, thereby improving the security of data exchange in a blockchain network.
    Type: Grant
    Filed: February 9, 2021
    Date of Patent: March 5, 2024
    Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
    Inventors: Jun Zang, Jianjun Zhang, Luohai Zheng, Junjie Shi, Hujia Chen, Zichao Tang, Yige Cai, Qing Qin, Chuanbing Dai, Hu Lan, Jinlong Chen
  • Patent number: 11124475
    Abstract: A hydrogen sulfide donor in an organic salt form and a preparation method thereof. The hydrogen sulfide donor exists as a salt formed by organic compounds with an alkaline motif and hydrogen sulfide with weak acidity. The hydrogen sulfide donor features with a simple structure, and an easy preparation method. Moreover, hydrogen sulfide donors in different forms can be prepared according to research and development needs. After the hydrogen sulfide donor enters an organism, the process of in vivo dissociation and hydrogen sulfide supply is simple, rapid, and effective, and there is no requirement for enzyme or any other complicated condition, and thus, the hydrogen sulfide donor has a great application prospect and value.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: September 21, 2021
    Assignee: CHENGDU KAOENSI SCIENCE AND TECHNOLOGY CO., LTD.
    Inventors: Hu Zheng, Lingling Weng
  • Publication number: 20200199067
    Abstract: A hydrogen sulfide donor in an organic salt form and a preparation method thereof. The hydrogen sulfide donor exists as a salt formed by organic compounds with an alkaline motif and hydrogen sulfide with weak acidity. The hydrogen sulfide donor features with a simple structure, and an easy preparation method. Moreover, hydrogen sulfide donors in different forms can be prepared according to research and development needs. After the hydrogen sulfide donor enters an organism, the process of in vivo dissociation and hydrogen sulfide supply is simple, rapid, and effective, and there is no requirement for enzyme or any other complicated condition, and thus, the hydrogen sulfide donor has a great application prospect and value.
    Type: Application
    Filed: March 15, 2018
    Publication date: June 25, 2020
    Inventors: Hu ZHENG, Lingling WENG
  • Patent number: 10658489
    Abstract: A semiconductor device and a fabrication method are provided. The fabrication method includes providing a gate structure on a substrate and a first protective layers on the gate structure; forming an initial sidewall spacer on a sidewall of each of the gate structure and the first protective layer; forming a first sidewall spacer on a sidewall of the initial sidewall spacer, the first and initial sidewall spacers being made of different materials; forming a second sidewall spacer by removing a portion of the initial sidewall spacer, leaving a trench formed above the second sidewall spacer and between the first sidewall spacer and the first protective layer; and forming a second protective layer in the trench, the second protective layer and the first sidewall spacer being made of a same material. The second sidewall spacer has a top surface higher than or level with a top surface of the gate structure.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: May 19, 2020
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Er Hu Zheng, Lu Jun Zou
  • Patent number: 10573551
    Abstract: An etching method and a fabrication method of semiconductor structures are provided. The etching method includes forming trenches in a to-be-etched structure, and forming a dielectric layer in the trenches. The etching method further includes etching the dielectric layer in the trenches by an etching process, and controlling at least an etching temperature of the etching process while a polymer is formed on side surface of the to-be-etched structure. During the etching process of the dielectric layer, the polymer undergoes a deposition stage and a removal stage. The deposition stage has a deposition rate of the polymer greater than an etch rate of the polymer, and the removal stage has the deposition rate of the polymer less than the etch rate of the polymer.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: February 25, 2020
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Min Da Hu, Er Hu Zheng, Cheng Long Zhang, Hai Yang Zhang
  • Publication number: 20180261610
    Abstract: A semiconductor device and a fabrication method are provided. The fabrication method includes providing a gate structure on a substrate and a first protective layers on the gate structure; forming an initial sidewall spacer on a sidewall of each of the gate structure and the first protective layer; forming a first sidewall spacer on a sidewall of the initial sidewall spacer, the first and initial sidewall spacers being made of different materials; forming a second sidewall spacer by removing a portion of the initial sidewall spacer, leaving a trench formed above the second sidewall spacer and between the first sidewall spacer and the first protective layer; and forming a second protective layer in the trench, the second protective layer and the first sidewall spacer being made of a same material. The second sidewall spacer has a top surface higher than or level with a top surface of the gate structure.
    Type: Application
    Filed: March 6, 2018
    Publication date: September 13, 2018
    Inventors: Er Hu ZHENG, Lu Jun ZOU
  • Publication number: 20170294343
    Abstract: An etching method and a fabrication method of semiconductor structures are provided. The etching method includes forming trenches in a to-be-etched structure, and forming a dielectric layer in the trenches. The etching method further includes etching the dielectric layer in the trenches by an etching process, and controlling at least an etching temperature of the etching process while a polymer is formed on side surface of the to-be-etched structure. During the etching process of the dielectric layer, the polymer undergoes a deposition stage and a removal stage. The deposition stage has a deposition rate of the polymer greater than an etch rate of the polymer, and the removal stage has the deposition rate of the polymer less than the etch rate of the polymer.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 12, 2017
    Inventors: Min Da HU, Er Hu ZHENG, Cheng Long ZHANG, Hai Yang ZHANG
  • Patent number: 6028207
    Abstract: A compound represented by the following formula (I):X--Y--Z (I)where Y is represented by the following formulae: ##STR1## X is a monovalent group of a tetracycline type compounds and Z is a monoent group of a steroid type compound such as estrogen.The compound can concentrate on the bone tissue and has bone resorption inhibition/ossification promotion functions.
    Type: Grant
    Filed: July 3, 1997
    Date of Patent: February 22, 2000
    Assignees: Iskra Industry Co., Ltd., Institute of Pharmacology, West China University of Medical Sciences
    Inventors: Hu Zheng, Lingling Weng
  • Patent number: 5760214
    Abstract: A compound represented by the following formula (I):X--Y--Z (I)?where Y is represented by the following formula (III): ##STR1## X is a monovalent group of a tetracycline type compound, and Z is a monovalent group of a steroid type compound such as estrogen!. The compound can concentrate on the bone tissue and has a bone resorption inhibition/ossification promotion functions.
    Type: Grant
    Filed: March 1, 1995
    Date of Patent: June 2, 1998
    Assignees: Iskra Industry Co., Ltd., Institute of Pharmacology, West China Univ. of Medical Sciences
    Inventors: Hu Zheng, Lingling Weng
  • Patent number: 5698542
    Abstract: A pharmaceutical composition comprising a compound represented by the following formula (I):X--Y--Z (I)?where Y is represented by the following formula (III): ##STR1## X is a monovalent group of a tetracycline type compound, and Z is a monovalent group of asteroid type compound such as estrogen!.The compound can concentrate on the bone tissue and has a bone resorption inhibition/ossification promotion functions.
    Type: Grant
    Filed: August 29, 1995
    Date of Patent: December 16, 1997
    Assignees: Iskra Industry Co., Ltd., Institute of Pharmacology, West China Univ. of Medical Sciences
    Inventors: Hu Zheng, Lingling Weng