Patents by Inventor Hua-Chun Yuan

Hua-Chun Yuan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for processing a substrate
    Patent number: 7326302
    Abstract: An apparatus for processing a substrate has a liquid supply unit, a nozzle unit, a first valve and a second valve. The liquid supply unit has an output port and an input port, and a processing liquid is output from the output port. The nozzle unit has a first port and a second port, and the first port is connected to the output port of the liquid supply unit. The first valve is connected between the second port of the nozzle unit and the input port of the liquid supply unit. The second valve is connected between the second port of the nozzle unit and the output port of the liquid supply unit. Moreover, the switch states of the first and second valves are opposite in order to control whether the nozzle unit spreads the processing liquid on the substrate.
    Type: Grant
    Filed: August 24, 2004
    Date of Patent: February 5, 2008
    Assignee: Hannstar Display Corporation
    Inventors: Kun-Hsiang Chiang, Hua-Chun Yuan
  • Apparatus and method for processing a substrate
    Publication number: 20060013960
    Abstract: An apparatus for processing a substrate has a liquid supply unit, a nozzle unit, a first valve and a second valve. The liquid supply unit has an output port and an input port, and a processing liquid is output from the output port. The nozzle unit has a first port and a second port, and the first port is connected to the output port of the liquid supply unit. The first valve is connected between the second port of the nozzle unit and the input port of the liquid supply unit. The second valve is connected between the second port of the nozzle unit and the output port of the liquid supply unit. Moreover, the switch states of the first and second valves are opposite in order to control whether the nozzle unit spreads the processing liquid on the substrate.
    Type: Application
    Filed: August 24, 2004
    Publication date: January 19, 2006
    Inventors: Kun-Hsiang Chiang, Hua-Chun Yuan