Patents by Inventor Hua Fu

Hua Fu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11952368
    Abstract: Provided are a fibroblast activation protein inhibitor (FAPI) dimer compound, an FAPI dimer-based positron emission tomography (PET) imaging agent for tumor diagnosis, and a preparation method and use thereof. An amphiphilic polyethylene glycol (PEG) chain and a dimerized structure of FAPI in the FAPI dimer compound with a structure shown in formula I can improve the in vivo kinetic properties of the compound and prolong a residence time of the compound in a tumor, thereby improving the uptake and imaging effects in the tumor. The accurate tumor diagnosis can be achieved by labeling the FAPI dimer compound with a diagnostic nuclide (68Ga), which has promising application prospects in PET imaging for diagnosis and in the preparation of a therapeutic nuclide (such as 177Lu or 90Y)-labeled drug for treating a FAP-?-expressing tumor.
    Type: Grant
    Filed: September 29, 2022
    Date of Patent: April 9, 2024
    Assignee: Xiamen University
    Inventors: Haojun Chen, Liang Zhao, Qin Lin, Kaili Fu, Yizhen Pang, Zhide Guo, Jianyang Fang, Long Sun, Hua Wu
  • Publication number: 20240111790
    Abstract: Techniques are provided for optimizing storage of database records in segments using sub-segments. A base segment is a container used for storing records that belong to a database object. A database management system receives a request to load, into the database object, a first set of records that are in a first state. In response to receiving the request, the system generates a new sub-segment, which is a container that is separate from the base segment. The system stores the first set of records, in their first state, within the sub-segment. The system then monitors one or more characteristics of the database system. In response to the one or more characteristics satisfying criteria, the system performs a migration of one or more records of the first set of records from the sub-segment to the base segment. During the migration, the system converts the one or more records from the first state to a second state and stores the one or more records, in their second state, in the base segment.
    Type: Application
    Filed: September 26, 2023
    Publication date: April 4, 2024
    Inventors: Teck Hua Lee, Hariharan Lakshmanan, Sujatha Muthulingam, Andrew Witkowski, Shasank Kisan Chavan, You Jung Kim, Sooyeon Jo, Yu Chieh Fu, Vicente Hernandez Jimenez, Tirthankar Lahiri
  • Patent number: 11942486
    Abstract: The present invention provides a display panel. By changing a wiring mode of data lines of a sub-pixel, a non-display area of a first sub-pixel is provided with a data line branched in the display area, and a display area of the first sub-pixel is further provided with a second data line, such that by setting opposite signals of the first data line and the second data line, the coupling voltages of the two data line signals to the sub-pixels can be offset by each other, and the problem of vertical crosstalk of an ultra-narrow border display is improved.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: March 26, 2024
    Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventors: Sen Xu, Bangqing Xiao, Hua Fu
  • Publication number: 20240038131
    Abstract: A display device is provided, including a circuit board, a display panel, a plurality of clock signal lines, and a plurality of grounding resistors. Each clock signal line extends from the circuit board to a non-display area of the display panel. The plurality of grounding resistors are disposed on the circuit board. Each grounding resistor is connected to a corresponding clock signal line, and is configured to reduce a voltage value of high level of the clock signal.
    Type: Application
    Filed: November 16, 2021
    Publication date: February 1, 2024
    Inventors: Xiaohui YAO, Hua FU, Zhida XU
  • Publication number: 20240013703
    Abstract: A display device is provided, including a circuit board, a display panel, a plurality of clock signal lines, and a plurality of grounding capacitors. The display panel is connected to the circuit board. Each clock signal line extends from the circuit board to the display panel. The plurality of grounding capacitors are disposed on the circuit board. Each grounding capacitor is connected to a corresponding clock signal line.
    Type: Application
    Filed: November 24, 2021
    Publication date: January 11, 2024
    Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
    Inventor: Hua Fu
  • Publication number: 20230367195
    Abstract: An extreme ultraviolet (EUV) mask includes a multilayer Mo/Si stack comprising alternating Mo and Si layers disposed over a first major surface of a mask substrate, a capping layer made of ruthenium (Ru) disposed over the multilayer Mo/Si stack, and an absorber layer on the capping layer. The EUV mask includes a circuit pattern area and a particle attractive area, and the capping layer is exposed at bottoms of patterns in the particle attractive area.
    Type: Application
    Filed: July 24, 2023
    Publication date: November 16, 2023
    Inventors: Chih-Tsung SHIH, Tsung-Chih CHIEN, Shih-Chi FU, Chi-Hua FU, Kuotang CHENG, Bo-Tsun LIU, Tsung Chuan LEE
  • Patent number: 11774844
    Abstract: An extreme ultraviolet (EUV) mask includes a multilayer Mo/Si stack comprising alternating Mo and Si layers disposed over a first major surface of a mask substrate, a capping layer made of ruthenium (Ru) disposed over the multilayer Mo/Si stack, and an absorber layer on the capping layer. The EUV mask includes a circuit pattern area and a particle attractive area, and the capping layer is exposed at bottoms of patterns in the particle attractive area.
    Type: Grant
    Filed: March 14, 2022
    Date of Patent: October 3, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Tsung Shih, Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua Fu, Kuotang Cheng, Bo-Tsun Liu, Tsung Chuan Lee
  • Publication number: 20220406816
    Abstract: The present invention provides a display panel. By changing a wiring mode of data lines of a sub-pixel, a non-display area of a first sub-pixel is provided with a data line branched in the display area, and a display area of the first sub-pixel is further provided with a second data line, such that by setting opposite signals of the first data line and the second data line, the coupling voltages of the two data line signals to the sub-pixels can be offset by each other, and the problem of vertical crosstalk of an ultra-narrow border display is improved.
    Type: Application
    Filed: December 21, 2020
    Publication date: December 22, 2022
    Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventors: Sen XU, Bangqing XIAO, Hua FU
  • Publication number: 20220197127
    Abstract: An extreme ultraviolet (EUV) mask includes a multilayer Mo/Si stack comprising alternating Mo and Si layers disposed over a first major surface of a mask substrate, a capping layer made of ruthenium (Ru) disposed over the multilayer Mo/Si stack, and an absorber layer on the capping layer. The EUV mask includes a circuit pattern area and a particle attractive area, and the capping layer is exposed at bottoms of patterns in the particle attractive area.
    Type: Application
    Filed: March 14, 2022
    Publication date: June 23, 2022
    Inventors: Chih-Tsung SHIH, Tsung-Chih CHIEN, Shih-Chi FU, Chi-Hua FU, Kuotang CHENG, Bo-Tsun LIU, Tsung Chuan LEE
  • Patent number: 11275301
    Abstract: An extreme ultraviolet (EUV) mask includes a multilayer Mo/Si stack comprising alternating Mo and Si layers disposed over a first major surface of a mask substrate, a capping layer made of ruthenium (Ru) disposed over the multilayer Mo/Si stack, and an absorber layer on the capping layer. The EUV mask includes a circuit pattern area and a particle attractive area, and the capping layer is exposed at bottoms of patterns in the particle attractive area.
    Type: Grant
    Filed: August 2, 2019
    Date of Patent: March 15, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Tsung Shih, Tsung-Chih Chien, Shih-Chi Fu, Chi-Hua Fu, Kuotang Cheng, Bo-Tsun Liu, Tsung Chuan Lee
  • Publication number: 20220010539
    Abstract: An ultra-large horizontal seepage test system with intelligent graded loading and variable seepage path is provided, which includes a water storage system, a water pressure system, a horizontal seepage test system and an intelligent loading and control system. The water storage system, the water pressure system and the horizontal seepage test system are connected in sequence, and the water pressure system is used to apply a water pressure and a vertical pressure to a test piece to be tested in the horizontal seepage test system. An outlet valve of the horizontal seepage test system is connected to the water storage system, and the intelligent loading and control system is used to control operations of electrical components of the water pressure system and the horizontal seepage test system. With the test system, a water head pressure can be loaded intelligently, and an infiltration angle of water inflow can be adjusted.
    Type: Application
    Filed: September 23, 2021
    Publication date: January 13, 2022
    Inventors: Beixiao Shi, Shengshui Chen, Hua Ling, Jianwei Zhang, Guangze Shen, Hua Fu, Huaqiang Han, Weiwei Xu
  • Patent number: 11198984
    Abstract: Provided is an underwater repair system for a cavity region of a concrete panel rock-fill dam panel, including a moving platform, a work cabin, a pressure drainage apparatus, a traction apparatus, and a positioning apparatus; the traction apparatus controlling the movement of the moving platform on the surface of a dam concrete panel; the positioning apparatus transmits a detection position; the work cabin is a pressure cabin, the work cabin being connected to the pressure drainage apparatus, and a drill apparatus and grouting apparatus being arranged in the work cabin; the moving platform moves into the cavity region, and the pressure drainage apparatus starts up to drain the water in the work cabin, a partially closed waterless space being formed inside the work cabin, the drill apparatus drilling the concrete panel at the upper end of the cavity region and the grouting apparatus subsequently implementing grouting to complete the repair.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: December 14, 2021
    Assignees: NANJING HYDRAULIC RESEARCH INSTITUTE UNDER THE MINISTRY OF WATER RESOURCES, THE MINISTRY OF TRANSPORT AND THE MINISTRY OF ELECTRIC, CHENGDU BRANCH OF GUODIAN ACADEMY OF SCIENCE AND TECHNOLOGY CO., LTD.
    Inventors: Yingli Wu, Ruiji Yi, Sheng Yang, Wanli Guo, Denghua Li, Limin Xiao, Jingping Ming, Qiming Zhong, Hongxia Fan, Hua Fu, Hua Ling, Fang Wang, Ting Shen, Yong Li, Yongyong Cao, Jun Li, Ming Zhang, Zhaosheng Zhang, Zehua Huangfu, Shilin Li, Juhua Zhang, Jiefu Wu, Zhe Hu, Lifei Gong, Gang Wu, Yufeng Huangfu, Chen Chen, Jing Yuan
  • Patent number: 11201055
    Abstract: A method for manufacturing a semiconductor device includes forming a semiconductor layer on a substrate, forming a high-? dielectric layer directly on the semiconductor layer as formed, and annealing the semiconductor layer, the high-dielectric layer, and the substrate. The semiconductor layer is a Group III-V compound semiconductor.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: December 14, 2021
    Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., NATIONAL TAIWAN UNIVERSITY
    Inventors: Chien-Hua Fu, Keng-Yung Lin, Yen-Hsun Lin, Kuanhsiung Chen, Juei-Nai Kwo, Minghwei Hong
  • Patent number: 11042660
    Abstract: In one implementation, a first access behavior is determined. The first access behavior is for accessing a first dataset associated with a first tenant of a storage system, and the first dataset is stored in a first data node in the storage system. A second access behavior is determined. The second access behavior is for accessing a data entry that is to be added into a second dataset associated with a second tenant of the storage system, and the second dataset is stored in at least one data node in the storage system. In response to a deviation between the first access behavior and second access behavior being above a predefined threshold, the data entry is stored into the first data node.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: June 22, 2021
    Assignee: International Business Machines Corporation
    Inventors: Ke Zhang, Li Niu, Zhe Yan, Lei He, Hua Fu
  • Publication number: 20210164183
    Abstract: Provided is an underwater repair system for a cavity region of a concrete panel rock-fill dam panel, including a moving platform, a work cabin, a pressure drainage apparatus, a traction apparatus, and a positioning apparatus; the traction apparatus controlling the movement of the moving platform on the surface of a dam concrete panel; the positioning apparatus transmits a detection position, the work cabin is a pressure cabin, the work cabin being connected to the pressure drainage apparatus, and a drill apparatus and grouting apparatus being arranged in the work cabin; the moving platform moves into the cavity region, and the pressure drainage apparatus starts up to drain the water in the work cabin, a partially closed waterless space being formed inside the work cabin, the drill apparatus drilling the concrete panel at the upper end of the cavity region and the grouting apparatus subsequently implementing grouting to complete the repair.
    Type: Application
    Filed: February 13, 2019
    Publication date: June 3, 2021
    Inventors: Yingli WU, Ruiji YI, Sheng YANG, Wanli GUO, Denghua LI, Limin XIAO, Jingping MING, Qiming ZHONG, Hongxia FAN, Hua FU, Hua LING, Fang WANG, Ting SHEN, Yong LI, Yongyong CAO, Jun LI, Ming ZHANG, Zhaosheng ZHANG, Zehua HUANGFU, Shilin LI, Juhua ZHANG, Jiefu WU, Zhe HU, Lifei GONG, Gang WU, Yufeng HUANGFU, Chen CHEN, Jing YUAN
  • Publication number: 20210163940
    Abstract: The disclosure describes that both Cas9 and Cpf1 enzymes can exhibit potent nickase activities on an extensive class of mismatched dsDNA targets. These properties allow the production of efficient nickases for a chosen dsDNA target sequence, without modification of the nuclease protein, using guide RNAs with a variety of patterns of mismatch to the intended DNA target. In parallel to the nicking activities observed with purified Cas9 in vitro, sequence-dependent nicking for both perfectly matched and partially mismatched target sequences in a Saccharomyces cerevisae in vivo system was observed.
    Type: Application
    Filed: October 29, 2020
    Publication date: June 3, 2021
    Applicant: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Xu Hua FU, Andrew FIRE, Justin D. SMITH
  • Patent number: 11021402
    Abstract: A method of preparing a C/C-SiC composite part, including: preparing, using a solvent evaporation process, carbon fiber composite powders coated with a phenol resin; according to a three-dimensional model of a to-be-prepared part, forming a green part corresponding to the to-be-prepared part using the carbon fiber composite powders and a 3D printing technology; densifying the green part to yield a C/C porous body having a density of 0.7 to 1.1 g/cm3 and an open porosity of 30 to 50%; and siliconizing the C/C porous body under vacuum, removing excess silicon to yield a primary carbon fiber reinforced carbon-silicon carbide (C/C-SiC) body, densifying the primary C/C-SiC body, to obtain a final C/C-SiC composite part.
    Type: Grant
    Filed: July 4, 2019
    Date of Patent: June 1, 2021
    Assignee: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Chunze Yan, Wei Zhu, Hua Fu, Zhongfeng Xu, Yusheng Shi, Chenhui Li, Jiamin Wu, Shifeng Wen, Zhaoqing Li
  • Publication number: 20200117815
    Abstract: In one implementation, a first access behavior is determined. The first access behavior is for accessing a first dataset associated with a first tenant of a storage system, and the first dataset is stored in a first data node in the storage system. A second access behavior is determined. The second access behavior is for accessing a data entry that is to be added into a second dataset associated with a second tenant of the storage system, and the second dataset is stored in at least one data node in the storage system. In response to a deviation between the first access behavior and second access behavior being above a predefined threshold, the data entry is stored into the first data node.
    Type: Application
    Filed: October 10, 2018
    Publication date: April 16, 2020
    Inventors: Ke Zhang, Li Niu, Zhe Yan, Lei He, Hua Fu
  • Patent number: 10584889
    Abstract: A magnetic switch controlled circuit for an electrical appliance includes a voltage input terminal, a voltage output terminal, a magnetic switch, a relay circuitry and a turn-off delay circuitry. When the magnetic switch detects a first change in the magnetic field from an idle status, the relay circuitry is configured to output an output voltage to the voltage output terminal so as to supply power to the electrical appliance. When the magnetic switch detects a second change in the magnetic field from the first change in the magnetic field, the turn-off delay circuitry is configured to control the relay circuitry to continue outputting the output voltage to the voltage output terminal for a predetermined period of time, the relay circuitry being switched off by the turn-off delay circuitry after the predetermined period of time elapses.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: March 10, 2020
    Inventor: Hua Fu Situ
  • Publication number: 20200073225
    Abstract: An extreme ultraviolet (EUV) mask includes a multilayer Mo/Si stack comprising alternating Mo and Si layers disposed over a first major surface of a mask substrate, a capping layer made of ruthenium (Ru) disposed over the multilayer Mo/Si stack, and an absorber layer on the capping layer. The EUV mask includes a circuit pattern area and a particle attractive area, and the capping layer is exposed at bottoms of patterns in the particle attractive area.
    Type: Application
    Filed: August 2, 2019
    Publication date: March 5, 2020
    Inventors: Chih-Tsung SHIH, Tsung-Chih CHIEN, Shih-Chi FU, Chi-Hua FU, Kuotang CHENG, Bo-Tsun LIU, Tsung Chuan LEE