Abstract: This application relates to a charging protection circuit. The charging protection circuit implements overcurrent protection by using a four-terminal NMOS switching transistor. In the solution provided in this application, floating management is performed on a Sub port of the four-terminal NMOS switching transistor. Specifically, when the four-terminal NMOS switching transistor is turned on, potential of the Sub port is pulled up, to avoid an excessively large internal resistance of the four-terminal NMOS switching transistor caused by an excessively large voltage between the Sub port and a drain of the four-terminal NMOS switching transistor. In addition, this application further provides a charging circuit and an electronic device.

Abstract: A semiconductor device, a terminal device, and a manufacturing method, where the device uses a groove-gate structure and a double-longitudinal reduced surface field (RESURF) technology using a longitudinal field plate and a longitudinal PN junction, and a channel is disposed on a bottom of a groove. The device is implemented based on a conventional spit trench gate metal-oxide-semiconductor (MOS) process or a monolithic integrated bipolar-complementary MOS (CMOS)-double-diffused MOS field-effect transistor (DMOS) (BCD) process technology.

Abstract: Disclosed is a method of fast identifying the distribution rule of wind speed, for identifying an optimal distribution rule of known wind speeds, wherein transforming all types of distribution rules to be selected by Rosenblatt transformation to a uniform type based on the selected distribution type of the probability paper, and drawing the reference curve on the probability paper; selecting a plurality of distribution rules, selecting the known wind speed data as the sample data and comparing the point set of the sample data to the reference curve; judging the optimal distribution rule among the selected distribution rules according to the comparison result. The present invention is appropriate for identifying the distribution of wind speed of different range; the method is not specific to any probability paper that has wide applicability.

Abstract: A semiconductor device having a dummy trench structure. The dummy trench structure vertically extends from the top surface of the semiconductor device through a body region into a semiconductor initial layer, and the body region separates the dummy trench structure from a source region. The dummy trench structure has a trench dielectric and a trench conductive material. The semiconductor initial layer, the trench dielectric and the trench conductive material are served as a capacitor of an integrated snubber of the semiconductor device, and the trench conductive material is served as a resistor of the snubber.

Abstract: A semiconductor device reducing parasitic loop inductance of system for the switching converter. The semiconductor device has an input voltage pin, a ground reference pin, a switching pin, and a semiconductor die, wherein the semiconductor die comprises a high-side power switch and a low-side power switch and a metal connection. The metal connection directly connects the high-side power switch and the first terminal of the low-side power switch, and is along and proximity to an edge of the semiconductor device to which the input voltage pin is distributed.

Abstract: A synchronous switching converter has an integrated semiconductor device. The integrated semiconductor device has a first semiconductor component and a second semiconductor component coupled in parallel. The first semiconductor component has MOSFET cells with body diodes, and the second semiconductor component has diode cells or MOSFET cells with a low forward voltage. Cells of the second semiconductor component distribute among the first semiconductor component unevenly according to a distribution of a current flowing through the integrated semiconductor device.

Abstract: A synchronous switching converter has an integrated semiconductor device. The integrated semiconductor device has a first semiconductor component and a second semiconductor component coupled in parallel. The first semiconductor component has MOSFET cells with body diodes, and the second semiconductor component has diode cells or MOSFET cells with a low forward voltage. Cells of the second semiconductor component distribute among the first semiconductor component unevenly according to a distribution of a current flowing through the integrated semiconductor device.

Abstract: A semiconductor device reducing parasitic loop inductance of system for the switching converter. The semiconductor device has an input voltage pin, a ground reference pin, a switching pin, and a semiconductor die, wherein the semiconductor die comprises a high-side power switch and a low-side power switch and a metal connection. The metal connection directly connects the high-side power switch and the first terminal of the low-side power switch, and is along and proximity to an edge of the semiconductor device to which the input voltage pin is distributed.

Abstract: A field effect transistor (“FET”), a termination structure and associated method for manufacturing. The FET has a plurality of active transistor cells and a termination structure. The termination structure for the FET includes a plurality of termination cells arranged substantially in parallel from an inner side toward an outer side of a termination area of the FET. Each of the termination cells comprises a termination trench lined with a termination insulation layer and filled with a termination conduction layer. The innermost termination cell is electrically coupled to gate regions of the active transistor cells while the rest of the termination cells are electrically floating.

Abstract: A field effect transistor (“FET”), a termination structure and associated method for manufacturing. The FET has a plurality of active transistor cells and a termination structure. The termination structure for the FET includes a plurality of termination cells arranged substantially in parallel from an inner side toward an outer side of a termination area of the FET. Each of the termination cells comprises a termination trench lined with a termination insulation layer and filled with a termination conduction layer. The innermost termination cell is electrically coupled to gate regions of the active transistor cells while the rest of the termination cells are electrically floating.

Abstract: A semiconductor device having an ESD protection structure and a method for forming the semiconductor device. The semiconductor device further includes a semiconductor transistor formed in an active cell area of a substrate. The ESD protection structure is formed atop a termination area of the substrate and is of solid closed shape. The ESD protection structure includes a central doped zone of a first conductivity type and a plurality of second-conductivity-type doped zones and first-conductivity-type doped zones alternately disposed surrounding the central doped zone. The central doped zone occupies substantially the entire portion of the ESD protection structure that is overlapped by a gate metal pad, and is electrically coupled to the gate metal pad. The outmost first-conductivity-type doped zone is electrically coupled to a source metal. The ESD protection structure features a reduced resistance and an improved current uniformity and provides enhanced ESD protection to the transistor.