Patents by Inventor Huan-Ting Lin

Huan-Ting Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112959
    Abstract: A method of fabricating a device includes forming a dummy gate over a plurality of fins. Thereafter, a first portion of the dummy gate is removed to form a first trench that exposes a first hybrid fin and a first part of a second hybrid fin. The method further includes filling the first trench with a dielectric material disposed over the first hybrid fin and over the first part of the second hybrid fin. Thereafter, a second portion of the dummy gate is removed to form a second trench and the second trench is filled with a metal layer. The method further includes etching-back the metal layer, where a first plane defined by a first top surface of the metal layer is disposed beneath a second plane defined by a second top surface of a second part of the second hybrid fin after the etching-back the metal layer.
    Type: Application
    Filed: December 1, 2023
    Publication date: April 4, 2024
    Inventors: Kuan-Ting PAN, Zhi-Chang LIN, Yi-Ruei JHAN, Chi-Hao WANG, Huan-Chieh SU, Shi Ning JU, Kuo-Cheng CHIANG
  • Patent number: 11916131
    Abstract: According to an exemplary embodiment, a method of forming a vertical device is provided. The method includes: providing a protrusion over a substrate; forming an etch stop layer over the protrusion; laterally etching a sidewall of the etch stop layer; forming an insulating layer over the etch stop layer; forming a film layer over the insulating layer and the etch stop layer; performing chemical mechanical polishing on the film layer and exposing the etch stop layer; etching a portion of the etch stop layer to expose a top surface of the protrusion; forming an oxide layer over the protrusion and the film layer; and performing chemical mechanical polishing on the oxide layer and exposing the film layer.
    Type: Grant
    Filed: November 4, 2020
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Chun-Hung Lee, Ming-Ching Chang, Huan-Just Lin
  • Patent number: 10734039
    Abstract: A voltage-enhanced-feedback sense amplifier of a resistive memory is configured to sense a first bit line and a second bit line. The voltage-enhanced-feedback sense amplifier includes a voltage sense amplifier and a voltage-enhanced-feedback pre-amplifier. The voltage-enhanced-feedback pre-amplifier is electrically connected to the voltage sense amplifier. A first bit-line amplifying module receives a voltage level of the second input node to suppress a voltage drop of the first bit line and amplifies a voltage level of the first input node according to a voltage level of the first bit line. A second bit-line amplifying module receives the voltage level of the first input node to suppress a voltage drop of the second bit line and amplifies the voltage level of the second input node according to a voltage level of the second bit line. A margin enhanced voltage difference is greater than a read voltage difference.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: August 4, 2020
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Meng-Fan Chang, Huan-Ting Lin
  • Publication number: 20200105315
    Abstract: A voltage-enhanced-feedback sense amplifier of a resistive memory is configured to sense a first bit line and a second bit line. The voltage-enhanced-feedback sense amplifier includes a voltage sense amplifier and a voltage-enhanced-feedback pre-amplifier. The voltage-enhanced-feedback pre-amplifier is electrically connected to the voltage sense amplifier. A first bit-line amplifying module receives a voltage level of the second input node to suppress a voltage drop of the first bit line and amplifies a voltage level of the first input node according to a voltage level of the first bit line. A second bit-line amplifying module receives the voltage level of the first input node to suppress a voltage drop of the second bit line and amplifies the voltage level of the second input node according to a voltage level of the second bit line. A margin enhanced voltage difference is greater than a read voltage difference.
    Type: Application
    Filed: September 27, 2018
    Publication date: April 2, 2020
    Inventors: Meng-Fan CHANG, Huan-Ting LIN
  • Patent number: 10510406
    Abstract: An operating method of the soft-verify write assist circuit of the resistive memory provides a voltage level applying step, a write operating step and a write voltage controlling step. The voltage level applying step is for applying a plurality of voltage levels to the reference voltage, the word line and the switching signal, respectively. The write operating step is for driving the memory cell to perform in a set process or a reset process via the first three-terminal switching element, the second three-terminal switching element and the soft-verify controlling unit during a write operation. The write voltage controlling step is for controlling the write voltage to be increased in the ramping cycle and decreased in the soft-verify cycle.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: December 17, 2019
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Meng-Fan Chang, Huan-Ting Lin, Tsung-Yuan Huang, Wei-Hao Chen, Han-Wen Hu