Patents by Inventor Huapeng Huang
Huapeng Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11933747Abstract: The system for in-situ real-time measurements of microstructure properties of 3D-printing objects during 3-D printing processes. An intensive parallel X-ray beam (with an adjustable beam size) impinges on a printing object and is diffracted on a crystal lattice of the printing material. The diffracted radiation impinges on a reflector formed with an array of reflector crystals mounted on an arcuated substrate. The diffracted beams reflected from the reflector crystals correspond to the diffraction intensity peaks produced by interaction of the crystal lattice of the printing material with the impinging X-ray beam. The intensities of the diffraction peaks are observed by detectors which produce corresponding output signals, which are processed to provide critical information on the crystal phase composition, which is closely related to the defects and performance of the printing objects.Type: GrantFiled: June 28, 2018Date of Patent: March 19, 2024Assignees: University of Maryland, College Park, Advanced Analyzer Labs., Inc.Inventors: Peter Zavalij, Huapeng Huang, Lester W. Schultheis
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Publication number: 20230194445Abstract: The system for in-situ real-time measurements of microstructure properties of 3D-printing objects during 3-D printing processes. An intensive parallel X-ray beam (with an adjustable beam size) impinges on a printing object and is diffracted on a crystal lattice of the printing material. The diffracted radiation impinges on a reflector formed with an array of reflector crystals mounted on an arcuated substrate. The diffracted beams reflected from the reflector crystals correspond to the diffraction intensity peaks produced by interaction of the crystal lattice of the printing material with the impinging X-ray beam. The intensities of the diffraction peaks are observed by detectors which produce corresponding output signals, which are processed to provide critical information on the crystal phase composition, which is closely related to the defects and performance of the printing objects.Type: ApplicationFiled: June 28, 2018Publication date: June 22, 2023Inventors: PETER ZAVALIJ, HUAPENG HUANG, LESTER W. SCHULTHEIS
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Patent number: 8647705Abstract: A method for forming a superconductive article is disclosed. According to one method, a substrate is provided, the substrate having an aspect ratio of not less than about 1×103, forming a buffer layer overlying the substrate, forming a superconductor layer overlying the buffer layer, and characterizing at least one of the substrate, the buffer layer and the superconductor layer by x-ray diffraction. In this regard, x-ray diffraction is carried out such that data are taken at multiple phi angles. Data acquisition at multiple phi angles permits robust characterization of the film or layer subject to characterization, and such data may be utilized for process control and/or quality control. Additional methods for forming superconductive articles, and for characterizing same with XRD are also disclosed.Type: GrantFiled: May 7, 2012Date of Patent: February 11, 2014Assignee: SuperPower, Inc.Inventors: Jodi Lynn Reeves, David M. Gibson, Walter M. Gibson, Huapeng Huang
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Publication number: 20130150247Abstract: A method for forming a superconductive article is disclosed. According to one method, a substrate is provided, the substrate having an aspect ratio of not less than about 1×103, forming a buffer layer overlying the substrate, forming a superconductor layer overlying the buffer layer, and characterizing at least one of the substrate, the buffer layer and the superconductor layer by x-ray diffraction. In this regard, x-ray diffraction is carried out such that data are taken at multiple phi angles. Data acquisition at multiple phi angles permits robust characterization of the film or layer subject to characterization, and such data may be utilized for process control and/or quality control. Additional methods for forming superconductive articles, and for characterizing same with XRD are also disclosed.Type: ApplicationFiled: May 7, 2012Publication date: June 13, 2013Applicant: SUPERPOWER INC.Inventors: Jodi Lynn Reeves, David M. Gibson, Walter M. Gibson, Huapeng Huang
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X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic
Patent number: 8130908Abstract: An x-ray diffraction apparatus for measuring crystal orientation of a multiple grain sample. An x-ray excitation path is provided having a focusing optic for collecting x-rays from an x-ray source and redirecting the collected x-rays into an x-ray beam converging on a single grain of the multiple grain sample. At least one point detector and the sample are rotated relative to each other; and a grain orientation is obtained based upon diffraction patterns collected from first and second grain crystal planes within the apparatus.Type: GrantFiled: February 23, 2010Date of Patent: March 6, 2012Assignee: X-Ray Optical Systems, Inc.Inventors: Huapeng Huang, Alexei Vershinin -
X-RAY DIFFRACTION APPARATUS AND TECHNIQUE FOR MEASURING GRAIN ORIENTATION USING X-RAY FOCUSING OPTIC
Publication number: 20110038457Abstract: An x-ray diffraction apparatus for measuring crystal orientation of a multiple grain sample. An x-ray excitation path is provided having a focusing optic for collecting x-rays from an x-ray source and redirecting the collected x-rays into an x-ray beam converging on a single grain of the multiple grain sample. At least one point detector and the sample are rotated relative to each other; and a grain orientation is obtained based upon diffraction patterns collected from first and second grain crystal planes within the apparatus.Type: ApplicationFiled: February 23, 2010Publication date: February 17, 2011Applicant: X-RAY OPTICAL SYSTEMS, INC.Inventors: Huapeng HUANG, Alexei VERSHININ -
Patent number: 7711088Abstract: An x-ray diffraction measurement apparatus for measuring a sample, having an x-ray source and detector coupled together in a combination for coordinated rotation around the sample, such that x-ray diffraction data can be taken at multiple phi angles. The apparatus may provide a pole figure representation of crystal orientation of the sample, wherein the pole figure represents the crystal alignment, and a full width half maximum value is calculated from the pole figure for crystal alignment quantification. Data may be taken at discrete positions along a length of the sample, and the sample is in a fixed position during measuring; or data may be taken continuously along a length of the article, as the sample continuously moves along its length in a movement path between the source and detector. The sample may be in the form of a tape, linearly passing through a measurement zone.Type: GrantFiled: July 16, 2004Date of Patent: May 4, 2010Assignees: X-Ray Optical Systems, Inc., Superpower, Inc.Inventors: David M. Gibson, Walter M. Gibson, Huapeng Huang, Jodi Lynn Reeves
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Publication number: 20080159479Abstract: An x-ray diffraction technique (apparatus, method and program products) for measuring crystal structure from a large sample area. The measurements are carried out using a large size collimating optic (up to 25 mm or more in diameter or corresponding cross-section) along with a 2-dimensional x-ray image detector. The unique characteristics of polycapillary collimating optics enable an efficient x-ray diffraction system (either low power or high power) to measure a large portion (or even the whole sample surface area) of the sample to obtain critical crystal structure information, such as the orientation of the whole sample, defects in the crystal, the presence of a secondary crystal, etc. Real-time, visual monitoring of the detected diffraction patterns is also provided. Turbine blade crystal structure measurement examples are disclosed.Type: ApplicationFiled: August 10, 2007Publication date: July 3, 2008Applicant: X-RAY OPTICAL SYSTEMS, INC.Inventors: Huapeng HUANG, Walter M. Gibson
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Patent number: 7236566Abstract: An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.Type: GrantFiled: February 3, 2006Date of Patent: June 26, 2007Inventors: David M. Gibson, Walter M. Gibson, Huapeng Huang
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Publication number: 20060140343Abstract: An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.Type: ApplicationFiled: February 3, 2006Publication date: June 29, 2006Applicant: X-Ray Optical Systems, Inc.Inventors: David Gibson, Walter Gibson, Huapeng Huang
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Publication number: 20050018809Abstract: An x-ray diffraction measurement apparatus for measuring a sample, having an x-ray source and detector coupled together in a combination for coordinated rotation around the sample, such that x-ray diffraction data can be taken at multiple phi angles. The apparatus may provide a pole figure representation of crystal orientation of the sample, wherein the pole figure represents the crystal alignment, and a full width half maximum value is calculated from the pole figure for crystal alignment quantification. Data may be taken at discrete positions along a length of the sample, and the sample is in a fixed position during measuring; or data may be taken continuously along a length of the article, as the sample continuously moves along its length in a movement path between the source and detector. The sample may be in the form of a tape, linearly passing through a measurement zone.Type: ApplicationFiled: July 16, 2004Publication date: January 27, 2005Applicants: X-RAY OPTICAL SYSTEMS, INC., SuperPower, Inc.Inventors: David Gibson, Walter Gibson, Huapeng Huang, Jodi Reeves
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Publication number: 20050014653Abstract: A method for forming a superconductive article is disclosed. According to one method, a substrate is provided, the substrate having an aspect ratio of not less than about 1×103, forming a buffer layer overlying the substrate, forming a superconductor layer overlying the buffer layer, and characterizing at least one of the substrate, the buffer layer and the superconductor layer by x-ray diffraction. In this regard, x-ray diffraction is carried out such that data are taken at multiple phi angles. Data acquisition at multiple phi angles permits robust characterization of the film or layer subject to characterization, and such data may be utilized for process control and/or quality control. Additional methods for forming superconductive articles, and for characterizing same with XRD are also disclosed.Type: ApplicationFiled: July 16, 2004Publication date: January 20, 2005Inventors: Jodi Reeves, David Gibson, Walter Gibson, Huapeng Huang