Abstract: Quantum dot devices with independent gate control are disclosed. An example quantum dot device includes N parallel rows of gate lines provided over a quantum well stack. Each of the N parallel rows of gate lines defines a respective row of a quantum dot formation region in the quantum well stack and includes M parallel gate lines stacked above one another. The quantum dot device may further include, for each of the N×M gate lines, a gate that extends toward the quantum well stack, where, for an individual row of the N parallel rows, gates that extend toward the quantum well stack from the M parallel stacked gate lines are arranged above a respective row of a quantum dot formation region in the quantum well stack. In this manner, each of the N×M gates responsible for formation of different quantum dots may be controlled independently.

Abstract: Quantum dot devices with three of more accumulation gates provided over a single row of a quantum dot formation region are disclosed. Each accumulation gate is electrically coupled to a respective doped region. In this manner, multiple single electron transistors (SETs) are provided along the row. Side and/or center screening gates may be used to apply microwave pulses for qubit control and to control electrostatics so that source and drain regions of the multiple SETs with quantum dots formed along the single row of a quantum dot formation region are sufficiently isolated from one another. Such quantum dot devices provide strong spatial localization of the quantum dots, good control over quantum dot interactions and manipulation, good scalability in the number of quantum dots included in the device, and/or design flexibility in making electrical connections to the quantum dot devices to integrate the quantum dot devices in larger computing devices.

Abstract: The present invention relates to a movable micro-element with reduced imprinting or hysteresis effect arranged spaced apart from a surface comprising at least one electrode. At least one restoring element is connected to said movable micro-element. An address electrode is arranged on said surface and capable to electrostatically attract said movable micro-element. Said address electrode is addressed to a first potential. Said movable micro-element is first set to a second potential defining a non addressed state and at a time period ?t before a predetermined pulsed signal is emitted said movable micro-element is switched from said second potential to a third potential defining an addressed state. Said movable micro-element is kept in said addressed state for a time period of ?t+?t?. The invention also relates to a Spatial Light Modulator (SLM), an apparatus for patterning a workpiece and a method of reducing an imprinting or hysteresis effect of a movable micro-element.

Abstract: The present invention relates to a movable micro-element with reduced imprinting or hysteresis effect arranged spaced apart from a surface comprising at least one electrode. At least one restoring element is connected to said movable micro-element. An address electrode is arranged on said surface and capable to electrostatically attract said movable micro-element. Said address electrode is addressed to a first potential. Said movable micro-element is first set to a second potential defining a non addressed state and at a time period &Dgr;t before a predetermined pulsed signal is emitted said movable micro-element is switched from said second potential to a third potential defining an addressed state. Said movable micro-element is kept in said addressed state for a time period of &Dgr;t+&Dgr;t′. The invention also relates to a Spatial Light Modulator (SLM), an apparatus for patterning a workpiece and a method of reducing an imprinting or hysteresis effect of a movable micro-element.

Abstract: The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle.

Abstract: The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle.

Abstract: An optical transmitter for transmission of data signals includes a laser diode producing optical radiation and a photodiode which in response thereto produces a photocurrent the mean value of which corresponds to the mean optical power of the radiation. Based on the photocurrent a control circuit derives parameters for controlling the laser current so as to compensate for changes in the characteristic line thereof, which line is the relation between optical power and laser current. Such parameters include a modulation current setting parameter U.sub.mod and a bias current setting parameter U.sub.0. The bias current is controlled to remain at or above the dip in the characteristic line at relatively low current levels.