Patents by Inventor Hubert Van Mierlo

Hubert Van Mierlo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Publication number: 20070146658
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a cleaning unit arranged to clean the patterning device in-situ, and/or a detection unit arranged to detect contamination of the patterning device in-situ.
    Type: Application
    Filed: December 27, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hubert Van Mierlo, Gert-Jan Heerens, Hans Meiling, Antonius Gerardus Maria Bastein, Jacques Cor Der Donck
  • Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus
    Publication number: 20070139855
    Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 21, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hubert Van Mierlo, Erik Ham, Hendricus Meijer, Hendrik Neerhof, Joost Ottens, Johannes Leijtens, Marco Kluse, Jan Hopman, Johannes Moors
  • Position determination method and a lithographic apparatus
    Publication number: 20060072087
    Abstract: An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.
    Type: Application
    Filed: October 1, 2004
    Publication date: April 6, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Jacob Frederik Klinkhamer, Anastasius Jacobus Bruinsma, Martinus Hendrikus Leenders, Hubert Van Mierlo
  • Alignment marker and lithographic apparatus and device manufacturing method using the same
    Publication number: 20060007442
    Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
    Type: Application
    Filed: June 8, 2005
    Publication date: January 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Gert-Jan Heerens, Anastasius Bruinsma, Jacob Klinkhamer, Bastiaan Lambertus Van De Ven, Hubert Van Mierlo, Willem Vliegenthart
  • Alignment marker and lithographic apparatus and device manufacturing method using the same
    Publication number: 20050275841
    Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
    Type: Application
    Filed: June 9, 2004
    Publication date: December 15, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Gert-Jan Heerens, Anastasius Bruinsma, Jacob Klinkhamer, Bastiaan Lambertus Marinus Van De Ven, Hubert Van Mierlo, Willem Vliegenthart