Patents by Inventor Hubertus Simons

Hubertus Simons has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment systems and methods for lithographic systems
    Publication number: 20060081792
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Application
    Filed: December 6, 2005
    Publication date: April 20, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
  • Alignment system and method and device manufactured thereby
    Publication number: 20050254030
    Abstract: An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.
    Type: Application
    Filed: May 14, 2004
    Publication date: November 17, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hoite Pieter Tolsma, Ramon Navarro Y. Koren, Hubertus Simons, Remi Edart, Pui Lam, Bernardus Hulshof, Roland Adrianus Bogers
  • Alignment systems and methods for lithographic systems
    Publication number: 20050189502
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Application
    Filed: September 22, 2003
    Publication date: September 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Johannes Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y Koren, Hoite Tolsma, Hubertus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar