Abstract: A method for manufacturing an indium gallium nitride quantum well is disclosed. The method includes providing a substrate in a process chamber, with the substrate including a gallium nitride layer. Having the process chamber reach a process vacuum. Providing a nitrogen molecular beam in plasma state, an indium molecular beam and an aluminum molecular beam into the process chamber simultaneously, controlling a flow rate ratio of the indium molecular beam to the aluminum molecular beam, and forming an indium aluminum nitride film on the gallium nitride layer, with the flow rate ratio being 0.6, 1.0, 1.29, 1.67 or 3.0. Forming an indium gallium nitride quantum well on the indium aluminum nitride film.