Patents by Inventor Huei-Mei Kao

Huei-Mei Kao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Real-time compensation of mechanical position error in pattern generation or imaging applications
    Patent number: 7397039
    Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, therefore, more accurate position measurements. Further, by including a measurement of a beam column, compensation for movement of the beam may be performed.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: July 8, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Bruce B. Baxter, Benyamin Buller, Wenwei Qiao, Huei-Mei Kao
  • Technique for writing with a raster scanned beam
    Patent number: 6828570
    Abstract: Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: December 7, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Lee H. Veneklasen, Stephen Rishton, Stacey J. Winter, Volker Boegli, Huei Mei Kao
  • Technique for writing with a raster scanned beam
    Publication number: 20030183782
    Abstract: Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.
    Type: Application
    Filed: April 1, 2002
    Publication date: October 2, 2003
    Inventors: Lee H. Veneklasen, Mary B. Veneklasen, Stephen Rishton, Stacey J. Winter, Volker Boegli, Huei Mei Kao