Patents by Inventor Huei-Mei Tsai

Huei-Mei Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160340216
    Abstract: A method for removing boron from boron-containing waste water includes performing oxidation/coagulation treatment on the boron-containing waste water in the presence of an oxidant (such as hydrogen peroxide) and a coagulant (such as barium hydroxide) to greatly reduce the boron content of the boron-containing waste water and then removing residual boron therefrom by an ion-exchange resin or reverse osmosis, such that the waste water thus treated meets effluent standards.
    Type: Application
    Filed: October 19, 2015
    Publication date: November 24, 2016
    Inventors: YAO-HUI HUANG, JUI-YEN LIN, CHIA-HSUN LIU, SHAO-YU WANG, PO-YEN CHEN, HUEI-MEI TSAI, BIING-JYH WENG
  • Patent number: 6503374
    Abstract: A novel SBTN (SraBibTacNbdOx) thin film which exhibits satisfactory ferroelectric properties is disclosed, wherein a lies between 0.5 and 1, b lies between 2 and 2.7, c lies between 1 and 1.4, d lies between 0.6 and 1.1, and x lies between 8 and 10. The composition of Sr0.8Bi2.5Ta1.2Nb0.9Ox wherein x lies between 9 and 10 is preferred. The Sr0.8Bi2.5Ta1.2Nb0.9Ox thin film is formed by two-target off-axis RF magnetron sputtering at a temperature down to about 600° C. One target is formed of Sr0.8Bi2.2Ta1.2Nb0.8O9, and the other target is formed of Bi2O3.
    Type: Grant
    Filed: August 29, 2000
    Date of Patent: January 7, 2003
    Assignee: National Science Council
    Inventors: Tseung-Yuen Tseng, Ming Shiahn Tsai, Huei-Mei Tsai, Pang Lin