Abstract: The present invention relates generally to the field of electrolytic and electroless metal plating. A method and system for determining the presence of analytes in metal plating solutions using Raman spectroscopy is described. High absorbance plating bath samples are analyzed by Raman spectroscopy by minimizing the penetration depth of the incident light beam. A chemical auto-dosing system for controlling the concentration of one or more plating bath additives in a metal plating bath is also provided.

Abstract: The present invention relates generally to the field of metal plating. More specifically, the present invention is related to a method and system for determining the presence of analytes in metal plating solutions using Raman spectroscopy. In an additional embodiment a chemical auto-dosing system for controlling the concentration of one or more plating bath additives in a metal plating bath is provided.

Abstract: A Raman spectroscopy method and system for quantifying the concentration of arsenic and/or other aqueous solution constituents. A variety of spectroscopy probe configurations and a chemical auto-dosing system are provided as well as a method for deconvoluting a spectrum with overlapping peaks to identify and quantify the concentrations of individual constituents of the solution based on a single spectrum.