Patents by Inventor Hughes WIAME

Hughes WIAME has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hollow cathode plasma source
    Patent number: 10586685
    Abstract: The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: March 10, 2020
    Assignees: AGC GLASS EUROPE, AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD.
    Inventors: Thomas Biquet, Peter Maschwitz, John Chambers, Hughes Wiame
  • Hollow cathode plasma source
    Patent number: 10535503
    Abstract: The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: January 14, 2020
    Assignees: AGC GLASS EUROPE, AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD.
    Inventors: Thomas Biquet, Peter Maschwitz, John Chambers, Hughes Wiame
  • HOLLOW CATHODE PLASMA SOURCE
    Publication number: 20180025892
    Abstract: The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).
    Type: Application
    Filed: December 5, 2014
    Publication date: January 25, 2018
    Applicants: AGC GLASS EUROPE, S.A., AGC FLAT GLASS NORTH AMERICA, INC., ASAHI GLASS CO., LTD.
    Inventors: Thomas BIQUET, Peter MASCHWITZ, John CHAMBERS, Hughes WIAME