Patents by Inventor Hugo Anton Marie de Haan

Hugo Anton Marie de Haan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device and method for generating a plasma discharge for patterning the surface of a substrate
    Patent number: 9161427
    Abstract: Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: October 13, 2015
    Assignee: Vision Dynamics Holding B.V.
    Inventors: Paulus Petrus Maria Blom, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Hugo Anton Marie De Haan, Antonius Hubertus Van Schijndel, Edwin Te Sligte, Nicolaas Cornelis Josephus Van Hijningen, Tom Huiskamp
  • Method and device for layer deposition
    Patent number: 8658521
    Abstract: Method for depositing a layer on a surface of a substrate. The method comprises injecting a precursor gas from a precursor supply into a deposition cavity for contacting the substrate surface, draining part of the injected precursor gas from the deposition cavity, and positioning the deposition cavity and the substrate relative to each other along a plane of the substrate surface. The method further comprising providing a first electrode and a second electrode, positioning the first electrode and the substrate relative to each other, and generating a plasma discharge near the substrate for contacting the substrate by generating a high-voltage difference between the first electrode and the second electrode. The method comprises generating the plasma discharge selectively, for patterning the surface by means of the plasma. A portion of the substrate contacted by the precursor gas selectively overlaps with a portion of the substrate contacted by the plasma.
    Type: Grant
    Filed: February 23, 2011
    Date of Patent: February 25, 2014
    Assignees: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO, Vision Dynamics Holding B.V.
    Inventors: Adrianus Johannes Petrus Maria Vermeer, Hugo Anton Marie De Haan
  • DEVICE AND METHOD FOR GENERATING A PLASMA DISCHARGE FOR PATTERNING THE SURFACE OF A SUBSTRATE
    Publication number: 20130206720
    Abstract: Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
    Type: Application
    Filed: February 17, 2010
    Publication date: August 15, 2013
    Applicant: VISION DYNAMICS HOLDING B.V.
    Inventors: Paulus Petrus Maria Blom, Alquin Alphons Elisabeth Stevens, Laurentia Johanna Huijbregts, Hugo Anton Marie De Haan, Antonius Hubertus Van Schijndel, Edwin Te Sligte, Nicolaas Cornelis Josephus Van Hijningen, Tom Huiskamp
  • METHOD AND DEVICE FOR LAYER DEPOSITION
    Publication number: 20130012029
    Abstract: Method for depositing a layer on a surface of a substrate. The method comprises injecting a precursor gas from a precursor supply into a deposition cavity for contacting the substrate surface, draining part of the injected precursor gas from the deposition cavity, and positioning the deposition cavity and the substrate relative to each other along a plane of the substrate surface. The method further comprising providing a first electrode and a second electrode, positioning the first electrode and the substrate relative to each other, and generating a plasma discharge near the substrate for contacting the substrate by generating a high-voltage difference between the first electrode and the second electrode. The method comprises generating the plasma discharge selectively, for patterning the surface by means of the plasma. A portion of the substrate contacted by the precursor gas selectively overlaps with a portion of the substrate contacted by the plasma.
    Type: Application
    Filed: February 23, 2011
    Publication date: January 10, 2013
    Applicants: Vision Dynamics Holding B.V., onderzoek TNO
    Inventors: Adrianus Johannes Petrus Maria Vermeer, Hugo Anton Marie De Haan
  • Apparatus and method for manufacturing optical objects
    Patent number: 7556554
    Abstract: The invention relates to an apparatus for forming or working optical elements and/or optical forming elements (1) comprising a working apparatus (18) for forming surfaces of form parts by machining or an abrasive technique, wherein at least one measuring device (17) is provided for measuring changes in form and/or surface roughness of said surface when said surface is being worked and, on the basis thereof controlling said working apparatus (18).
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: July 7, 2009
    Assignee: Nederlandse Organistie voor toegepastnatuurwetenschappelijk Onderzoek TNO
    Inventors: Hedser van Brug, Hugo Anton Marie de Haan, Jacobus Johannes Korpershoek, Ian J. Saunders