Patents by Inventor Hugo Babij

Hugo Babij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060252914
    Abstract: Disclosed is a modified rosin ester resin suitable for use in a water borne heatset weboffset ink. The rosin ester resin is modified with: (i) maleic anhydride or fumaric acid; and (ii) polyols and has an acid number of about 130 to about 160. The modified rosin ester resin provides good pigment wetting, fast drying, and water solubility.
    Type: Application
    Filed: May 3, 2005
    Publication date: November 9, 2006
    Inventors: Martin Czebotar, Hugo Babij
  • Publication number: 20040115561
    Abstract: Energy curable varnish and energy curable, water washable printing ink compositions suitable for waterless lithographic printing are disclosed each containing: water soluble ethylenically unsaturated reactive oligomers and monomers; water insoluble ethylenically unsaturated reactive oligomers and monomers; and a resin selected from water soluble non-reactive resins, a water insoluble acid or base functional resins and water insoluble ethylenically unsaturated reactive resins, wherein said water insoluble resins contain acid functional groups.
    Type: Application
    Filed: December 13, 2002
    Publication date: June 17, 2004
    Inventors: Mikhail Laksin, Hugo Babij, Paul J. Sirotto
  • Patent number: 6709503
    Abstract: A waterbased heatset offset lithographic ink comprising water, polyamide resins or fumarated rosin resins, hydroxyethylethylene urea, a modified linseed oil, a dibutylated benzoguanamine, a pigment and p-toluene sulfonic acid.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: March 23, 2004
    Assignee: Sun Chemical Corporation
    Inventors: Ramasamy Krishnan, Marilyn Yamat, Hugo Babij
  • Patent number: 6444022
    Abstract: A water based offset lithographic ink comprising water; a modified rosin polymer comprised of resins soluble in water regardless of the pH of the water, resin rosin salts soluble in water at pH ranging from 7.5 to 10 and aqueous emulsion resins; a modified linseed oil; and pigment.
    Type: Grant
    Filed: May 20, 2000
    Date of Patent: September 3, 2002
    Assignee: Sun Chemical Corporation
    Inventors: Ramasamy Krishnan, Martin Thomas Czebotar, Hugo Babij
  • Publication number: 20020083865
    Abstract: A water-based lithographic ink composition is described, and contains water, a resin-bonded pigment; a nonionic surfactant, a rewetting agent, and a polymerizable surfactant. The nonionic surfactant is present in an amount such that the dynamic surface tension of the total composition is about 20 to about 40 dynes/cm. The polymerizable surfactant is present in an amount of about 0.5% by weight to about 2% by weight of the composition. The ink composition may also contain other, conventional ink component, as desired.
    Type: Application
    Filed: December 28, 2001
    Publication date: July 4, 2002
    Inventors: Ramasamy Krishnan, Martin Thomas Czebotar, Marilyn Yamat, Hugo Babij
  • Patent number: 6200372
    Abstract: A single fluid water-based offset lithographic news ink comprising water; a macromolecular resin binder comprised of a resin soluble in water regardless of the pH of the water, a rosin salt resin soluble in water at pH ranging from 7.5 to 10 and an aqueous emulsion polymer; pigment; a water dispersible soy bean based polymer; and a hydroxyethylehtylene urea re-wetting agent.
    Type: Grant
    Filed: December 16, 1999
    Date of Patent: March 13, 2001
    Assignee: Sun Chemical Corporation
    Inventors: Ramasamy Krishnan, Neil Young, Keqi Gan, Marilyn Yamat, Hugo Babij, Martin Thomas Czebotar
  • Patent number: 5778789
    Abstract: An offset lithographic printing process comprising printing at a relative humidity of 75-90% utilizing a water-based, single fluid, fountain solution free, printing ink containing (a) a macromolecular binder composed of binders soluble in water regardless of the pH of the water; resin rosin salt binders soluble in water at a pH from 7.5 to 10; and aqueous emulsion binders; (b) pigment and; (c) a re-wetting agent.
    Type: Grant
    Filed: March 13, 1996
    Date of Patent: July 14, 1998
    Assignees: Sun Chemical, Heidelberg Harris
    Inventors: Ramasamy Krishnan, Marilyn C. Yamat, Hugo Babij, Roland T. Palmatier, Robert R. Murray
  • Patent number: 5725646
    Abstract: A water-based offset lithographic printing ink comprising 10-70 wt. % macromolecular binders comprising macromolecular binders soluble in water regardless of the pH; macromolecular rosin salt binders soluble in water at a pH ranging from 7.5 to 10; and macromolecular binders comprised of aqueous emulsions; pigment; and a hydroxyethylethylene urea re-wetting agent.
    Type: Grant
    Filed: March 13, 1996
    Date of Patent: March 10, 1998
    Assignee: Sun Chemical Corporation
    Inventors: Ramasamy Krishnan, Marilyn C. Yamat, Hugo Babij
  • Patent number: 5723514
    Abstract: The invention relates to a heatset intaglio printing ink especially suited for the intaglio printing of security documents such as currency, postage stamps, stock certificates, bank notes and the like. The ink comprises: a) an epoxy resin ester reacted with an unsaturated monobasic acid and a reactive monomer, b) a glycol and/or glycol ether, c) a pigment, d) a drier and e) a compound obtained by reacting an amine/epoxy adduct with a phenolic resin or polyhydric phenol compound.
    Type: Grant
    Filed: June 13, 1995
    Date of Patent: March 3, 1998
    Assignee: Sun Chemical Corporation
    Inventors: Solomon J. Nachfolger, Hugo Babij, Joseph Malanga, Ralph H. Reiter, Walter J. Glesias