Abstract: The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser epitaxy and analysis within the charged particle microscope and the combination of at least one cartridge and a laser for use in a charged-particle microscope to provide in-situ thermal laser epitaxy and analysis are also described.

Abstract: A charged particle microscope for imaging a specimen. The charged particle microscope includes a specimen holder movable into an imaging position intersecting an optical axis, a specimen chamber configured to receive the specimen holder in the imaging position, and a sorption pump disposed in the specimen chamber and configured to lower a pressure in the specimen chamber.

Abstract: A modular ultra-high vacuum (UHV) electron microscope for investigating a sample, according to the present disclosure includes a UHV chamber configured to reach and maintain an ultra-high vacuum within the UHV chamber, a UHV stage to hold the sample being investigated, a charged particle source configured to emit an electron beam toward the sample, and an optical column configured to direct the plurality of electrons to be incident on the sample. The modular UHV electron microscopes further include a carousel vacuum bay configured to reach and maintain an UHV independently of the UHV chamber, and which is connected to the UHV chamber via a port and contains at least one device manipulator. Each of the device manipulators comprise an attachment site for a microscope device, and are configured to, selectively translate attached microscope devices between the carousel vacuum bay and the UHV chamber via the valve.