Patents by Inventor Hugo Jacobus Gerardus Van Der Weijden

Hugo Jacobus Gerardus Van Der Weijden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rapid exchange device for lithography reticles
    Patent number: 9983487
    Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: May 29, 2018
    Assignees: ASML Holding N.V, ASML Netherlands B.V.
    Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden
  • Rapid Exchange Device for Lithography Reticles
    Publication number: 20160077443
    Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.
    Type: Application
    Filed: November 20, 2015
    Publication date: March 17, 2016
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Robert Gabriël Maria LANSBERGEN, George Hilary HARROLD, Richard John JOHNSON, Hugo Jacobus Gerardus VAN DER WEIJDEN
  • Rapid exchange device for lithography reticles
    Patent number: 9268241
    Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: February 23, 2016
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden
  • RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES
    Publication number: 20110020104
    Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.
    Type: Application
    Filed: April 14, 2009
    Publication date: January 27, 2011
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Robert Gabriel Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden