Patents by Inventor Hugo M. Visser

Hugo M. Visser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100311115
    Abstract: The present invention relates to the selective enrichment of post-translationally modified proteins and/or peptides from complex samples. In particular, the invention relates to methods for the separation of phospho-proteins and/or -peptides and/or for the discrimination between different subsets of phospho-proteins and/or -peptides.
    Type: Application
    Filed: November 17, 2008
    Publication date: December 9, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Ralf Hoffmann, Hugo M. Visser, Edwin P. Romijn
  • Publication number: 20100304493
    Abstract: The present invention relates to the selective enrichment of post-translationally modified proteins and/or peptides from complex samples by combining a particular protein/peptide labeling and fractionation strategy with specific chemical and/or enzymatic reactions targeting the post-translational modification to be analyzed. More specifically, the invention relates to methods for the enrichment and/or separation of phospho-proteins and/or -peptides, and particularly for the discrimination between different subsets of phospho-proteins and/or -peptides in complex samples.
    Type: Application
    Filed: November 17, 2008
    Publication date: December 2, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Ralf Hoffmann, Hugo M. Visser, Edwin P. Romijn
  • Patent number: 6774374
    Abstract: A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the vacuum chamber. The gap between the support pillar and the vacuum chamber wall may be sealed by a low-stiffness seal. The low stiffness seal may be a three part seal allowing relative motion in six-degrees of freedom.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: August 10, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes C. Driessen, Theodorus H. J. Bisschops, Jakob Vijfvinkel, Marinus J. J. Dona, Mark T. Meuwese, Ronald M. Schneider, Michel A. Mors, Hugo M. Visser
  • Patent number: 6724462
    Abstract: Optical elements such as multilayered EUV mirrors are provided with protective capping layers of diamond-like carbon (C), boron nitride (BN), boron carbide (B4C), silicon nitride (Si3N4), silicon carbide (SiC), B, Pd, Ru, Rh, Au, MgF2, LiF, C2F4 and TiN and compounds and alloys thereof. The final period of a multilayer coating may also be modified to provide improved protective characteristics.
    Type: Grant
    Filed: June 28, 2000
    Date of Patent: April 20, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Mandeep Singh, Hugo M. Visser
  • Patent number: 6576912
    Abstract: A lithographic projection apparatus has a discharge plasma radiation source that is contained in a vacuum chamber. The radiation source is to generate a beam of EUV radiation. A chamber wall of the vacuum chamber incorporates a channel structure comprising adjacent narrow channels separated by walls that are substantially parallel to a propagation direction of the radiation generated so as to pass the radiation from the vacuum chamber through the structure to another subsequent vacuum chamber. In the subsequent vacuum chamber, a much higher vacuum level (lower pressure) can be maintained than is present in the vacuum chamber of the radiation source.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: June 10, 2003
    Inventors: Hugo M. Visser, Richard L. Sandstrom, Theodorus H. J. Bisschops, Vadim Y. Banine, Jeroen Jonkers
  • Publication number: 20020084428
    Abstract: A lithographic projection apparatus has a discharge plasma radiation source that is contained in a vacuum chamber. The radiation source is to generate a beam of EUV radiation. A chamber wall of the vacuum chamber incorporates a channel structure comprising adjacent narrow channels separated by walls that are substantially parallel to a propagation direction of the radiation generated so as to pass the radiation from the vacuum chamber through the structure to another subsequent vacuum chamber. In the subsequent vacuum chamber, a much higher vacuum level (lower pressure) can be maintained than is present in the vacuum chamber of the radiation source.
    Type: Application
    Filed: January 3, 2001
    Publication date: July 4, 2002
    Inventors: Hugo M. Visser, Rick Sandstrom, Theodorus H.J. Bisschops, Vadim Y. Banine, Jeroen Jonkers
  • Patent number: RE42338
    Abstract: Optical elements such as multilayered EUV mirrors are provided with protective capping layers of diamond-like carbon (C), boron nitride (BN), boron carbide (B4C), silicon nitride (Si3N4), silicon carbide (SiC), B, Pd, Ru, Rh, Au, MgF2, LiF, C2F4 and TiN and compounds and alloys thereof. The final period of a multilayer coating may also be modified to provide improved protective characteristics.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: May 10, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Mandeep Singh, Hugo M. Visser