Abstract: The invention provides a method and a system for manipulating an image displayed on a screen (11), where an operator uses e.g. a finger to identify a region of interest (ROI) without touching the screen (11). The spatial position of the finger relative to the screen (11) is detected, i.e. its x, y and z coordinates. A region of interest (ROI) on the screen (11) including the two coordinates (x, y) is selected, and an image property such as contrast in the selected region of interest is changed in dependence on the distance (z) of the movable object (13) from the screen (11). The invention is ideal for manipulating medical images such as X-ray images, but applications in consumer electronics are also conceivable where image processing is performed.

Abstract: The present invention relates to methods allowing the selective enrichment of N-terminal fragments of polypeptides and/or peptides from complex samples by combining a particular polypeptide/peptide labeling and fractionation strategy with specific chemical and/or enzymatic reactions targeting the N-terminal fragments to be analyzed.

Abstract: A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

Abstract: The present invention relates to the selective enrichment of post-translationally modified proteins and/or peptides from complex samples, wherein the post-translational modification is glycosylation, by combining a particular protein/peptide labeling protocol with the specific selection of the post-translationally modified proteins and/or peptides to be analyzed.

Abstract: The present invention relates to a surgical instrument. In particular the invention relates to a surgical instrument applicable in endoscopic surgery. In order to provide a simple and cheap solution for indicating the distance between a surgical instrument and its target, a surgical instrument (1) is suggested, which comprises a number of optical members (20, 21) to provide a diverging light emission in the direction of an instrument's target (5) in order to give an indication of the distance (10) between the instrument (1) and its target (5).

Abstract: A method of controlling a liquid crystal display monitor (2) is disclosed. The monitor has a liquid crystal display panel (4) having a plurality of pixels, a digital to analogue converter (30) for inputting image data to the display panel, and a backlight unit (20) having discharge lamps (22). A controller (26) determines whether an average brightness of an image is above a predetermined threshold value and sets the backlight unit (20) to a lower luminance setting in response to determination that said average brightness is above said threshold value to avoid discomfort to a user viewing the monitor.

Abstract: A liquid crystal display comprising first and second liquid crystal display panel (1, 3), each defining an array of picture elements (13, 15). The resolution of the image displayed on the second liquid crystal display panel (3) is lower than that of the image displayed on the first liquid crystal display panel (1). The picture elements (15) of the second liquid crystal display panel (3), located between the first liquid crystal display panel (1) and backlighting means (2) may be relatively large and preferably partially overlap at least in one direction. A charge is selectively applied to the picture elements (15) of the second liquid crystal display panel (3) corresponding to the relatively darker portions of the image to be displayed on the first liquid crystal panel (1), so as to at least limit the amount of light reaching these portions of the first liquid crystal display panel (1) and thereby increasing the contrast trio of the device.

Abstract: An autostereoscopic display 101, which provides a depth perception by providing a viewer's left and right eyes (104a, 104b) with two slightly different perspectives of an image to be displayed, is provided for ultrasound guided interventions with a surgical instrument (103). The surgeon watches displayed ultrasound data (102), rendered for at least two views. The plane at which those views (L, R) intersect is adjusted to correspond exactly with the tracked three-dimensional position within a displayed scene of the surgical instrument (103), which position can be extracted from the three-dimensional ultrasound data by means of, for example, 3D object recognition. Thus, the point of reconstruction of the image presented to the viewer can be dynamically adjusted to correspond with the position of the surgical instrument on which the surgeon's eyes are presumed to be focused.

Abstract: According to one embodiment of the present disclosure, a method of providing 3D data sets for stand-alone use includes providing a 3D viewing program on a computer readable media and providing at least one 3D data set on the same computer readable media, wherein responsive to a computer activation of the 3D viewing program, the 3D viewing program operates to provide a 3D rendering based upon the at least one 3D data set.

Abstract: A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

Abstract: A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam provides the beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

Abstract: A lithographic projection apparatus comprises a contaminant trap (10) for trapping debris from the radiation source (LA) or from the resist (RL) on a substrate (W), which trap comprises two sets (11,12) of channels (20,21:30,31) arranged radially around the optical axis of the projection beam (PB) with a space (13) between them. Gas is supplied to the space. The flow resistance of the channels ensures that the gas pressure outside the trap (10) is much lower then that inside.

Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

Abstract: A lithographic projection apparatus includes a radiation system configured to form a projection beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the projection beam provides the projection beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

Abstract: A lithographic projection apparatus comprises a contaminant trap (10) for trapping debris from the radiation source (LA) or from the resist (RL) on a substrate (W), which trap comprises two sets (11,12) of channels (20,21:30,31) arranged radially around the optical axis of the projection beam (PB) with a space (13) between them. Gas is supplied to the space. The flow resistance of the channels ensures that the gas pressure outside the trap (10) is much lower then that inside.