Patents by Inventor Hugo Thomas LOOIJESTIJN

Hugo Thomas LOOIJESTIJN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF USING A DUAL STAGE LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS
    Publication number: 20230010584
    Abstract: A method of using a dual stage lithographic apparatus, wherein the lithographic apparatus includes: two substrate supports each arranged to move and support a substrate, a measure field in which selectively one of the two substrate supports is positioned to measure a feature of the substrate supported by the respective one of the two substrate supports, and an expose field in which selectively one of the two substrate supports is positioned to expose the substrate supported by the respective one of the two substrate supports to a patterned beam of radiation, the method including thermal relaxation of a substrate loaded on one of the two substrate supports, wherein the thermal relaxation is at least partially performed at the expose field and/or in transfer between the measure field and the expose field.
    Type: Application
    Filed: December 21, 2020
    Publication date: January 12, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wouter Jan Cornelis VIJSELAAR, Hugo Thomas LOOIJESTIJN
  • METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
    Publication number: 20220342319
    Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
    Type: Application
    Filed: July 1, 2022
    Publication date: October 27, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
  • Method for determining contribution to a fingerprint
    Patent number: 11378891
    Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: July 5, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
  • METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
    Publication number: 20210003927
    Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
  • Method for determining contribution to a fingerprint
    Patent number: 10816904
    Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: October 27, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
  • METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
    Publication number: 20190271919
    Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
    Type: Application
    Filed: May 23, 2018
    Publication date: September 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Davit HARUTYUNYAN, Fei JIA, Frank STAALS, Fuming WANG, Hugo Thomas LOOIJESTIJN, Cornelis Johannes RIJNIERSE, Maxim PISARENCO, Roy WERKMAN, Thomas THEEUWES, Tom VAN HEMERT, Vahid BASTANI, Jochem Sebastian WILDENBERG, Everhardus Cornelis MOS, Erik Johannes Maria WALLERBOS