Patents by Inventor Hui Ting Wang

Hui Ting Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11968908
    Abstract: In an embodiment, a method includes: forming a first inter-metal dielectric (IMD) layer over a semiconductor substrate; forming a bottom electrode layer over the first IMD layer; forming a magnetic tunnel junction (MTJ) film stack over the bottom electrode layer; forming a first top electrode layer over the MTJ film stack; forming a protective mask covering a first region of the first top electrode layer, a second region of the first top electrode layer being uncovered by the protective mask; forming a second top electrode layer over the protective mask and the first top electrode layer; and patterning the second top electrode layer, the first top electrode layer, the MTJ film stack, the bottom electrode layer, and the first IMD layer with an ion beam etching (IBE) process to form a MRAM cell, where the protective mask is etched during the IBE process.
    Type: Grant
    Filed: June 30, 2022
    Date of Patent: April 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tai-Yen Peng, Hui-Hsien Wei, Han-Ting Lin, Sin-Yi Yang, Yu-Shu Chen, An-Shen Chang, Qiang Fu, Chen-Jung Wang
  • Publication number: 20220071934
    Abstract: Provided is a pharmaceutical composition for use in treating postsurgical pain. The pharmaceutical composition comprises a lipid-based complex. The lipid-based complex comprises an amide-type anesthetic and at least one lipid, wherein a molar ratio of the amide-type anesthetic to the at least one lipid of the lipid-based complex is at least 0.5:1. The total amount of the amide-type anesthetic is at least 1.5 to 5 times of a standard therapeutic dose for treating postsurgical pain with the amide-type anesthetic to achieve an improved pain control with desired prolonged analgesic effect.
    Type: Application
    Filed: February 26, 2020
    Publication date: March 10, 2022
    Inventors: TIEN-TZU TAI, YUN-LONG TSENG, SHEUE-FANG SHIH, MIN-WEN KUO, CARL OSCAR BROWN, HUI-TING WANG, WEENEE YEUN NG JAO, PEI-HSIEN HU, WAN-NI YU, KEELUNG HONG, HAO-WEN KAO, YI-YU LIN
  • Patent number: 8450524
    Abstract: The present invention relates to a process for producing carboxylic acid anhydrides by the carbonylation reaction of a carboxylic acid ester, derived from an alcohol and a carboxylic acid, with carbon monoxide containing a small amount of hydrogen in a liquid reaction medium in the presence of a Group VIII B catalyst to produce a carboxylic acid anhydride. The liquid reaction medium comprises the Group VIII B catalyst, an organic halide, the carboxylic acid ester, an alkali metal salt, the carboxylic acid anhydride, the carboxylic acid, N-acetylimidazole as a protecting agent, and ethylidene diacetate (EDA) as an organic promoter. By making use of the protecting agent of N-acetylimidazole, metal ions in the reactor can be prevented from reacting with EDA so as to reduce the formation of hardly-soluble tars during the reaction. Also, the EDA organic promoter is kept at a certain content in the system to promote the overall carbonylation reaction rate.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: May 28, 2013
    Assignee: China Petrochemical Development Corporation
    Inventors: Hui Ting Wang, Chia Jung Tsai, Chia Hui Shen
  • Publication number: 20120053366
    Abstract: The present invention relates to a process for producing carboxylic acid anhydrides by the carbonylation reaction of a carboxylic acid ester, derived from an alcohol and a carboxylic acid, with carbon monoxide containing a small amount of hydrogen in a liquid reaction medium in the presence of a Group VIII B catalyst to produce a carboxylic acid anhydride. The liquid reaction medium comprises the Group VIII B catalyst, an organic halide, the carboxylic acid ester, an alkali metal salt, the carboxylic acid anhydride, the carboxylic acid, N-acetylimidazole as a protecting agent, and ethylidene diacetate (EDA) as an organic promoter. By making use of the protecting agent of N-acetylimidazole, metal ions in the reactor can be prevented from reacting with EDA so as to reduce the formation of hardly-soluble tars during the reaction. Also, the EDA organic promoter is kept at a certain content in the system to promote the overall carbonylation reaction rate.
    Type: Application
    Filed: January 21, 2011
    Publication date: March 1, 2012
    Inventors: Hui Ting Wang, Chia Jung Tsai, Chia Hui Shen